We investigated the diffusion of boron (B) by the irradiation of cw CO 2 laser light. The diffusion of B was enhanced by irradiating the laser light during annealing in Ar/O2ambient. It was found that the irradiation of the laser light had the effect of enhances on the growth of an oxide layer. The possible mechanism of the enhanced diffusion is that the excess self-interstitials injected by oxidation at a laser-irradiated point assist the diffusion of B.
|Number of pages||4|
|Journal||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|Issue number||8 A|
|Publication status||Published - Aug 6 2007|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)