Enhancement of critical current density in ErBa2Cu 3Oy thin films by post-annealing

Shigeru Horii, Ataru Ichinose, Masashi Mukaida, Kaname Matsumoto, Tohru Ohazama, Yutaka Yoshida, Jun Ichi Shimoyama, Kohji Kishio

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23 Citations (Scopus)

Abstract

We report a remarkable increase in critical current density (Jc) by oxygen post-annealing for only a few tens of minutes in ErBa 2Cu3Oy films fabricated at two different pulsed-laser-deposition (PLD) temperatures of 720°C and 760°C. The Jc of these films were obviously enhanced to more than 1 MA·cm-2 in the annealing temperature range of 350°C-500°C in comparison with those of the as-deposited films (0.3-0.5 MA·cm-2). Even in a nonequilibrium process such as the PLD method, the homogenization of oxygen contents in films is crucial for enhancement of the films' critical current properties, which suggests that oxygen post-annealing is a practical process for improvement of critical current of PLD-REBa2Cu3Oy coated conductors.

Original languageEnglish
Pages (from-to)L1223-L1225
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume43
Issue number9 AB
DOIs
Publication statusPublished - Sep 15 2004
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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    Horii, S., Ichinose, A., Mukaida, M., Matsumoto, K., Ohazama, T., Yoshida, Y., Shimoyama, J. I., & Kishio, K. (2004). Enhancement of critical current density in ErBa2Cu 3Oy thin films by post-annealing. Japanese Journal of Applied Physics, Part 2: Letters, 43(9 AB), L1223-L1225. https://doi.org/10.1143/JJAP.43.L1223