Enhancement of magnetoresistance by hydrogen ion treatment for current-perpendicular-to-plane giant magnetoresistive films with a current-confined-path nano-oxide layer

Hiromi Yuasa, M. Hara, S. Murakami, Y. Fuji, H. Fukuzawa, K. Zhang, M. Li, E. Schreck, P. Wang, M. Chen

Research output: Contribution to journalArticle

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Abstract

We have enhanced magnetoresistance (MR) for current-perpendicular-to-plane giant-magnetoresistive (CPP-GMR) films with a current-confined-path nano-oxide layer (CCP-NOL). In order to realize higher purity in Cu for CCPs, hydrogen ion treatment (HIT) was applied as the CuO x reduction process. By applying the HIT process, an MR ratio was increased to 27.4% even in the case of using conventional FeCo magnetic layer, from 13.0% for a reference without the HIT process. Atom probe tomography data confirmed oxygen reduction by the HIT process in the CCP-NOL. The relationship between oxygen counts and MR ratio indicates that further oxygen reduction would realize an MR ratio greater than 50%.

Original languageEnglish
Article number112501
JournalApplied Physics Letters
Volume97
Issue number11
DOIs
Publication statusPublished - Sep 13 2010
Externally publishedYes

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hydrogen ions
oxides
augmentation
oxygen
purity
tomography
probes
atoms

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Enhancement of magnetoresistance by hydrogen ion treatment for current-perpendicular-to-plane giant magnetoresistive films with a current-confined-path nano-oxide layer. / Yuasa, Hiromi; Hara, M.; Murakami, S.; Fuji, Y.; Fukuzawa, H.; Zhang, K.; Li, M.; Schreck, E.; Wang, P.; Chen, M.

In: Applied Physics Letters, Vol. 97, No. 11, 112501, 13.09.2010.

Research output: Contribution to journalArticle

Yuasa, Hiromi ; Hara, M. ; Murakami, S. ; Fuji, Y. ; Fukuzawa, H. ; Zhang, K. ; Li, M. ; Schreck, E. ; Wang, P. ; Chen, M. / Enhancement of magnetoresistance by hydrogen ion treatment for current-perpendicular-to-plane giant magnetoresistive films with a current-confined-path nano-oxide layer. In: Applied Physics Letters. 2010 ; Vol. 97, No. 11.
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AU - Hara, M.

AU - Murakami, S.

AU - Fuji, Y.

AU - Fukuzawa, H.

AU - Zhang, K.

AU - Li, M.

AU - Schreck, E.

AU - Wang, P.

AU - Chen, M.

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