Abstract
The authors review the growth conditions, properties, and applications of epitaxial alkaline earth fluoride films on Si substrates. The lattice mismatches of CaF//2, SrF//2, and BaF//2 to Si are about 0. 6%, 6. 8%, and 14. 2% at room temperature, respectively. The films are grown by molecular beam epitaxy or vacuum-deposition onto heated substrates, in which molecular beams of the fluorides are formed by evaporating polycrystalline fluoride grains.
Original language | English |
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Number of pages | 1 |
Journal | Electrochemical Society Extended Abstracts |
Volume | 85-1 |
Publication status | Published - Jan 1 1985 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
Cite this
EPITAXIAL GROWTH OF ALKALINE EARTH FLUORIDE FILMS ON Si SUBSTRATES. / Ishiwara, Hiroshi; Asano, Tanemasa.
In: Electrochemical Society Extended Abstracts, Vol. 85-1, 01.01.1985.Research output: Contribution to journal › Conference article
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TY - JOUR
T1 - EPITAXIAL GROWTH OF ALKALINE EARTH FLUORIDE FILMS ON Si SUBSTRATES.
AU - Ishiwara, Hiroshi
AU - Asano, Tanemasa
PY - 1985/1/1
Y1 - 1985/1/1
N2 - The authors review the growth conditions, properties, and applications of epitaxial alkaline earth fluoride films on Si substrates. The lattice mismatches of CaF//2, SrF//2, and BaF//2 to Si are about 0. 6%, 6. 8%, and 14. 2% at room temperature, respectively. The films are grown by molecular beam epitaxy or vacuum-deposition onto heated substrates, in which molecular beams of the fluorides are formed by evaporating polycrystalline fluoride grains.
AB - The authors review the growth conditions, properties, and applications of epitaxial alkaline earth fluoride films on Si substrates. The lattice mismatches of CaF//2, SrF//2, and BaF//2 to Si are about 0. 6%, 6. 8%, and 14. 2% at room temperature, respectively. The films are grown by molecular beam epitaxy or vacuum-deposition onto heated substrates, in which molecular beams of the fluorides are formed by evaporating polycrystalline fluoride grains.
UR - http://www.scopus.com/inward/record.url?scp=0021818038&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0021818038&partnerID=8YFLogxK
M3 - Conference article
AN - SCOPUS:0021818038
VL - 85-1
JO - Electrochemical Society Extended Abstracts
JF - Electrochemical Society Extended Abstracts
SN - 0160-4619
ER -