EPITAXIAL GROWTH OF FLUORIDE FILMS ON SILICON SUBSTRATES.

Hiroshi Ishiwara, Tanemasa Asano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)
Original languageEnglish
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherNorth-Holland
Pages393-403
Number of pages11
ISBN (Print)0444009051
Publication statusPublished - Jan 1 1984

Publication series

NameMaterials Research Society Symposia Proceedings
Volume25
ISSN (Print)0272-9172

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All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Ishiwara, H., & Asano, T. (1984). EPITAXIAL GROWTH OF FLUORIDE FILMS ON SILICON SUBSTRATES. In Materials Research Society Symposia Proceedings (pp. 393-403). (Materials Research Society Symposia Proceedings; Vol. 25). North-Holland.