Epitaxial stress effect on crystallographic properties of Bi4Ti3O12 heterostructures and their leakage current behaviors

Yukio Watanabe, Yasuaki Matsumoto, Mitsuru Tanamura

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Three dimensionally aligned epitaxial Bi4Ti3O12 films were grown on SrTiO3 (001) and LaAlO3 (001) substrates with and without a semiconductive La2CuO4 bottom layer. The leakage current and crystallographic properties of Bi4Ti3O12 were found to be markedly different from ABO3-type ferroelectric such as Pb(Zr, Ti)O3, BaTiO3, and SrTiO3. The d-spacings of Bi4Ti3O12 depend markedly on the substrate material, suggesting that the amount of misoriented domains formed to relieve epitaxial stress was less than that in ABO3-type ferroelectrics. This epitaxial stress effect was observed even in relatively thick films 1500 Å thick. Furthermore, the time dependence of the leakage current in Bi4Ti3O12 was substantially reduced compared to those in the ABO3-type ferroelectrics.

Original languageEnglish
Pages (from-to)5745-5751
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume35
Issue number11
DOIs
Publication statusPublished - Nov 1996
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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