Evaluation of aggregation structures at poly(4-trimethylsilylstyrene)/ polyisoprene blend thin film surfaces

Masayuki Ohya, Daisuke Kawaguchi, Atsushi Takano, Yushu Matsushita, Naoya Torikai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Surface aggregation behavior in blends of poly(4-trimethylsilylstyrene) (PTMSS) and polyisoprene (PI) mostly composed of 1,2 and 3,4-addition microstructures was investigated by atomic force microscopy (AFM). Below a lower critical solution temperature (LCST), the blend films were miscible in bulk and smooth at the surface. On the other hand, above LCST, the phase-separated structure was observed in bulk by optical microscopy, however, the surface still remained smooth, indicating that phase-separation did not take place. This result means that the phase-separation at PTMSS/PI blend films surface is prevented due to strong segregation of PTMSS at the surface.

Original languageEnglish
Title of host publication54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
Pages982
Number of pages1
Volume54
Edition1
Publication statusPublished - 2005
Externally publishedYes
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: May 25 2005May 27 2005

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period5/25/055/27/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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