Abstract
Surface aggregation behavior in blends of poly(4-trimethylsilylstyrene) (PTMSS) and polyisoprene (PI) mostly composed of 1,2 and 3,4-addition microstructures was investigated by atomic force microscopy (AFM). Below a lower critical solution temperature (LCST), the blend films were miscible in bulk and smooth at the surface. On the other hand, above LCST, the phase-separated structure was observed in bulk by optical microscopy, however, the surface still remained smooth, indicating that phase-separation did not take place. This result means that the phase-separation at PTMSS/PI blend films surface is prevented due to strong segregation of PTMSS at the surface.
Original language | English |
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Title of host publication | 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan |
Pages | 982 |
Number of pages | 1 |
Volume | 54 |
Edition | 1 |
Publication status | Published - 2005 |
Externally published | Yes |
Event | 54th SPSJ Annual Meeting 2005 - Yokohama, Japan Duration: May 25 2005 → May 27 2005 |
Other
Other | 54th SPSJ Annual Meeting 2005 |
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Country/Territory | Japan |
City | Yokohama |
Period | 5/25/05 → 5/27/05 |
All Science Journal Classification (ASJC) codes
- Engineering(all)