Evaluation of aggregation structures at poly(4-trimethylsilylstyrene)/ polyisoprene blend thin film surfaces

Masayuki Ohya; Daisuke Kawaguchi; Atsushi Takano; Yushu Matsushita; Naoya Torikai

Evaluation of aggregation structures at poly(4-trimethylsilylstyrene)/ polyisoprene blend thin film surfaces

Masayuki Ohya, Daisuke Kawaguchi, Atsushi Takano, Yushu Matsushita, Naoya Torikai

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Surface aggregation behavior in blends of poly(4-trimethylsilylstyrene) (PTMSS) and polyisoprene (PI) mostly composed of 1,2 and 3,4-addition microstructures was investigated by atomic force microscopy (AFM). Below a lower critical solution temperature (LCST), the blend films were miscible in bulk and smooth at the surface. On the other hand, above LCST, the phase-separated structure was observed in bulk by optical microscopy, however, the surface still remained smooth, indicating that phase-separation did not take place. This result means that the phase-separation at PTMSS/PI blend films surface is prevented due to strong segregation of PTMSS at the surface.

Original language	English
Title of host publication	54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
Pages	982
Number of pages	1
Volume	54
Edition	1
Publication status	Published - 2005
Externally published	Yes
Event	54th SPSJ Annual Meeting 2005 - Yokohama, Japan Duration: May 25 2005 → May 27 2005

Other

Other	54th SPSJ Annual Meeting 2005
Country/Territory	Japan
City	Yokohama
Period	5/25/05 → 5/27/05

All Science Journal Classification (ASJC) codes

Engineering(all)

Cite this

Evaluation of aggregation structures at poly(4-trimethylsilylstyrene)/ polyisoprene blend thin film surfaces. / Ohya, Masayuki; Kawaguchi, Daisuke; Takano, Atsushi; Matsushita, Yushu; Torikai, Naoya.

54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. Vol. 54 1. ed. 2005. p. 982.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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abstract = "Surface aggregation behavior in blends of poly(4-trimethylsilylstyrene) (PTMSS) and polyisoprene (PI) mostly composed of 1,2 and 3,4-addition microstructures was investigated by atomic force microscopy (AFM). Below a lower critical solution temperature (LCST), the blend films were miscible in bulk and smooth at the surface. On the other hand, above LCST, the phase-separated structure was observed in bulk by optical microscopy, however, the surface still remained smooth, indicating that phase-separation did not take place. This result means that the phase-separation at PTMSS/PI blend films surface is prevented due to strong segregation of PTMSS at the surface.",

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T1 - Evaluation of aggregation structures at poly(4-trimethylsilylstyrene)/ polyisoprene blend thin film surfaces

AU - Ohya, Masayuki

AU - Kawaguchi, Daisuke

AU - Takano, Atsushi

AU - Matsushita, Yushu

AU - Torikai, Naoya

PY - 2005

Y1 - 2005

N2 - Surface aggregation behavior in blends of poly(4-trimethylsilylstyrene) (PTMSS) and polyisoprene (PI) mostly composed of 1,2 and 3,4-addition microstructures was investigated by atomic force microscopy (AFM). Below a lower critical solution temperature (LCST), the blend films were miscible in bulk and smooth at the surface. On the other hand, above LCST, the phase-separated structure was observed in bulk by optical microscopy, however, the surface still remained smooth, indicating that phase-separation did not take place. This result means that the phase-separation at PTMSS/PI blend films surface is prevented due to strong segregation of PTMSS at the surface.

AB - Surface aggregation behavior in blends of poly(4-trimethylsilylstyrene) (PTMSS) and polyisoprene (PI) mostly composed of 1,2 and 3,4-addition microstructures was investigated by atomic force microscopy (AFM). Below a lower critical solution temperature (LCST), the blend films were miscible in bulk and smooth at the surface. On the other hand, above LCST, the phase-separated structure was observed in bulk by optical microscopy, however, the surface still remained smooth, indicating that phase-separation did not take place. This result means that the phase-separation at PTMSS/PI blend films surface is prevented due to strong segregation of PTMSS at the surface.

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M3 - Conference contribution

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BT - 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan

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ER -

Evaluation of aggregation structures at poly(4-trimethylsilylstyrene)/ polyisoprene blend thin film surfaces

Abstract

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All Science Journal Classification (ASJC) codes

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