Evaluation of Temperature at SiC Surface during Pulsed Excimer Laser Irradiation

Shogo Mutoh, Akihiro Ikeda, Hiroshi Ikenoue, Tanemasa Asano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

While high-energy and high-power lasers such as the excimer laser have high potential to provide benefits over conventional thermal processing for power devices made of wide bandgap semiconductors such as 4H-SiC, one of challenges remained is measurement of temperature of materials during processing. In this work, use of the two-color method is investigated to measure time evolution of temperature at the 4H-SiC surface during KrF excimer laser irradiation. It is shown that the surface temperature reaches about 3000 K within a few tens of nanoseconds, which reasonably agrees with thermal simulation. Diffusion of aluminum atoms induced by the laser irradiation is also investigated. Results suggest that diffusion coefficient can be extremely larger than extrapolated from values obtained by the conventional furnace annealing.

Original languageEnglish
Title of host publicationProceedings of the 2021 International Japan-Africa Conference on Electronics, Communications, and Computations, JAC-ECC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages217-220
Number of pages4
ISBN (Electronic)9781665482929
DOIs
Publication statusPublished - 2021
Event9th International Japan-Africa Conference on Electronics, Communications, and Computations, JAC-ECC 2021 - Virtual, Online, Egypt
Duration: Dec 13 2021Dec 14 2021

Publication series

NameProceedings of the 2021 International Japan-Africa Conference on Electronics, Communications, and Computations, JAC-ECC 2021

Conference

Conference9th International Japan-Africa Conference on Electronics, Communications, and Computations, JAC-ECC 2021
Country/TerritoryEgypt
CityVirtual, Online
Period12/13/2112/14/21

All Science Journal Classification (ASJC) codes

  • Computer Science Applications
  • Computer Networks and Communications
  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Instrumentation

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