Ex situ annealing method for c-axis oriented barium ferrite thick films

S. H. Gee, Y. K. Hong, Terumitsu Tanaka, M. H. Park

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

The development of a rf sputter deposition method to fabricate a 0.63 μm thick stack composed of several BaM layers was reported. The thickness of each layer was 0.09 μM to improve the c-axis orientation of the 0.63 μm thick film. Prior to the deposition of succeeding layer, each 0.09 μm layer ex-situ annealed at 800°C for 10 minutes. A squareness of 0.81 and 0.62 was showed by 0.63 μm thick BaM multilayered and single layered films, respectively.

Original languageEnglish
Pages (from-to)7507-7509
Number of pages3
JournalJournal of Applied Physics
Volume93
Issue number10 2
DOIs
Publication statusPublished - May 15 2003
Externally publishedYes

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thick films
barium
ferrites
annealing

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Ex situ annealing method for c-axis oriented barium ferrite thick films. / Gee, S. H.; Hong, Y. K.; Tanaka, Terumitsu; Park, M. H.

In: Journal of Applied Physics, Vol. 93, No. 10 2, 15.05.2003, p. 7507-7509.

Research output: Contribution to journalArticle

Gee, S. H. ; Hong, Y. K. ; Tanaka, Terumitsu ; Park, M. H. / Ex situ annealing method for c-axis oriented barium ferrite thick films. In: Journal of Applied Physics. 2003 ; Vol. 93, No. 10 2. pp. 7507-7509.
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