Fabrication of a gated cold cathode by using the inkjet embedding method

Akiyoshi Baba, Tanemasa Asano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We proposed the inkjet embedding method for fabrication of a gated cold cathode. Using the method, we demonstrated the field electron emission from the gated cold cathode. Surface treatment, droplet drying, and separation between the gate and carbon black are the key steps to successful fabrication of the gated FEA. This proposed method is expected to facilitate the development of a large area FED with low cost and low temperature processing. Low temperature processing characteristic has a potential application to FEDs on a plastic substrate for a flexible display.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2005
Subtitle of host publication2005 International Microprocesses and Nanotechnology Conference
Pages278-279
Number of pages2
Publication statusPublished - Dec 1 2005
Event2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan
Duration: Oct 25 2005Oct 28 2005

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference
Volume2005

Other

Other2005 International Microprocesses and Nanotechnology Conference
CountryJapan
CityTokyo
Period10/25/0510/28/05

Fingerprint

Cathodes
Flexible displays
Fabrication
Electron emission
Processing
Carbon black
Surface treatment
Drying
Plastics
Finite element method
Temperature
Substrates
Costs

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Baba, A., & Asano, T. (2005). Fabrication of a gated cold cathode by using the inkjet embedding method. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference (pp. 278-279). [1595322] (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005).

Fabrication of a gated cold cathode by using the inkjet embedding method. / Baba, Akiyoshi; Asano, Tanemasa.

Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. 2005. p. 278-279 1595322 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Baba, A & Asano, T 2005, Fabrication of a gated cold cathode by using the inkjet embedding method. in Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference., 1595322, Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, vol. 2005, pp. 278-279, 2005 International Microprocesses and Nanotechnology Conference, Tokyo, Japan, 10/25/05.
Baba A, Asano T. Fabrication of a gated cold cathode by using the inkjet embedding method. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. 2005. p. 278-279. 1595322. (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference).
Baba, Akiyoshi ; Asano, Tanemasa. / Fabrication of a gated cold cathode by using the inkjet embedding method. Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. 2005. pp. 278-279 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference).
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