Fabrication of a gated cold cathode by using the inkjet embedding method

Akiyoshi Baba, Tanemasa Asano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We proposed the inkjet embedding method for fabrication of a gated cold cathode. Using the method, we demonstrated the field electron emission from the gated cold cathode. Surface treatment, droplet drying, and separation between the gate and carbon black are the key steps to successful fabrication of the gated FEA. This proposed method is expected to facilitate the development of a large area FED with low cost and low temperature processing. Low temperature processing characteristic has a potential application to FEDs on a plastic substrate for a flexible display.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2005
Subtitle of host publication2005 International Microprocesses and Nanotechnology Conference
PublisherIEEE Computer Society
Pages278-279
Number of pages2
ISBN (Print)4990247221, 9784990247225
DOIs
Publication statusPublished - 2005
Externally publishedYes
Event2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan
Duration: Oct 25 2005Oct 28 2005

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference
Volume2005

Other

Other2005 International Microprocesses and Nanotechnology Conference
Country/TerritoryJapan
CityTokyo
Period10/25/0510/28/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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