Fabrication of a gated cold cathode by using the inkjet embedding method

Akiyoshi Baba; Tanemasa Asano

doi:10.1109/imnc.2005.203846

Fabrication of a gated cold cathode by using the inkjet embedding method

Akiyoshi Baba, Tanemasa Asano

Integrated Electronic Systems

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We proposed the inkjet embedding method for fabrication of a gated cold cathode. Using the method, we demonstrated the field electron emission from the gated cold cathode. Surface treatment, droplet drying, and separation between the gate and carbon black are the key steps to successful fabrication of the gated FEA. This proposed method is expected to facilitate the development of a large area FED with low cost and low temperature processing. Low temperature processing characteristic has a potential application to FEDs on a plastic substrate for a flexible display.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2005
Subtitle of host publication	2005 International Microprocesses and Nanotechnology Conference
Publisher	IEEE Computer Society
Pages	278-279
Number of pages	2
ISBN (Print)	4990247221, 9784990247225
DOIs	https://doi.org/10.1109/imnc.2005.203846
Publication status	Published - 2005
Event	2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan Duration: Oct 25 2005 → Oct 28 2005

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference
Volume	2005

Other

Other	2005 International Microprocesses and Nanotechnology Conference
Country	Japan
City	Tokyo
Period	10/25/05 → 10/28/05

All Science Journal Classification (ASJC) codes

Engineering(all)

Access to Document

10.1109/imnc.2005.203846

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Baba, A., & Asano, T. (2005). Fabrication of a gated cold cathode by using the inkjet embedding method. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference (pp. 278-279). [1595322] (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005). IEEE Computer Society. https://doi.org/10.1109/imnc.2005.203846

Fabrication of a gated cold cathode by using the inkjet embedding method. / Baba, Akiyoshi; Asano, Tanemasa.

Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. IEEE Computer Society, 2005. p. 278-279 1595322 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Baba, A & Asano, T 2005, Fabrication of a gated cold cathode by using the inkjet embedding method. in Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference., 1595322, Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, vol. 2005, IEEE Computer Society, pp. 278-279, 2005 International Microprocesses and Nanotechnology Conference, Tokyo, Japan, 10/25/05. https://doi.org/10.1109/imnc.2005.203846

Baba A, Asano T. Fabrication of a gated cold cathode by using the inkjet embedding method. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. IEEE Computer Society. 2005. p. 278-279. 1595322. (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference). https://doi.org/10.1109/imnc.2005.203846

Baba, Akiyoshi ; Asano, Tanemasa. / Fabrication of a gated cold cathode by using the inkjet embedding method. Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. IEEE Computer Society, 2005. pp. 278-279 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference).

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