Fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate

Tsuyoshi Fujimura, Akihiro Ikeda, Shin Ichi Etoh, Reiji Hattori, Yukinori Kuroki, Masanori Hidaka, Suk Sang Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper we study about the fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages86-87
Number of pages2
ISBN (Electronic)4891140402, 9784891140403
DOIs
Publication statusPublished - 2003
EventInternational Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
Duration: Oct 29 2003Oct 31 2003

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2003
CountryJapan
CityTokyo
Period10/29/0310/31/03

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate'. Together they form a unique fingerprint.

Cite this