We propose and demonstrate stamp technology, a novel processing technique for a field electron emitter, in which emitter tips are fabricated by pressing a mold into a spin-coated organic material to completely transform the shape of the mold. The material is then modified by ion irradiation to produce a carbon-based emitter material. Starting materials tested were a high-temperature-cured polyimide and a photoresist (novolac resin). The shape of the mold can be completely transferred to these materials at pressure over 700 MPa at 250°C. A field-emission current up to the order of μA is obtained from emitters fabricated by this new technology with modification using Ar-ion irradiation at an energy of 100 keV to a dose of 3 × 1016cm-2. The ion-beam-irradiation effect on polyimide and photoresist materials is also investigated in terms of electrical conductivity and chemical bonds.
|Number of pages||5|
|Journal||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|Issue number||12 B|
|Publication status||Published - Jan 1 1999|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)