Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target

D. Nakagauchi, Tsuyoshi Yoshitake, K. Nagayama

    Research output: Contribution to journalArticle

    13 Citations (Scopus)

    Abstract

    Ferromagnetic Fe3Si thin films were fabricated on Si and quartz substrates by pulsed laser deposition. It was found that the polycrystalline Fe3Si thin films were grown at the substrate temperature of 300°C, and this is a candidate for the ferromagnetic layer of the multi-layered GMR film. At room temperature, the ferromagnetic amorphous Fe 3Si thin film were grown and it is also extremely expectative as a ferromagnetic layer due to its nearly the same resistivity as that of semiconducting amorphous FeSi2. At substrate temperatures higher than 400°C, the FeSi crystallites were co-generated with Fe3Si crystallites on the Si substrate probably due to the diffusion of the Si atoms from the substrate into the film.

    Original languageEnglish
    Pages (from-to)653-657
    Number of pages5
    JournalVacuum
    Volume74
    Issue number3-4 SPEC. ISS.
    DOIs
    Publication statusPublished - Jun 7 2004

    Fingerprint

    Pulsed laser deposition
    pulsed laser deposition
    Fabrication
    Thin films
    fabrication
    Substrates
    thin films
    Crystallites
    crystallites
    Quartz
    Temperature
    quartz
    Atoms
    electrical resistivity
    room temperature
    atoms
    temperature

    All Science Journal Classification (ASJC) codes

    • Surfaces, Coatings and Films
    • Condensed Matter Physics
    • Surfaces and Interfaces

    Cite this

    Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target. / Nakagauchi, D.; Yoshitake, Tsuyoshi; Nagayama, K.

    In: Vacuum, Vol. 74, No. 3-4 SPEC. ISS., 07.06.2004, p. 653-657.

    Research output: Contribution to journalArticle

    Nakagauchi, D. ; Yoshitake, Tsuyoshi ; Nagayama, K. / Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target. In: Vacuum. 2004 ; Vol. 74, No. 3-4 SPEC. ISS. pp. 653-657.
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