Fabrication of hierarchically ordered hybrid structures over multiple length scales via direct etching of self-organized polyhedral oligomeric silsesquioxane (POSS) functionalized block copolymer films

Teruaki Hayakawa, Makoto Seino, Raita Goseki, Tomoyasu Hirai, Ryohei Kikuchi, Masa Aki Kakimoto, Masatoshi Tokita, Hideaki Yokoyama, Shin Horiuchi

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)

Abstract

A novel fabrication of hierarchically ordered organic and inorganic hybrid structures at length scales ranging from nanometers to micrometers was demonstrated by oxygen plasma treatment of self-organized silicon-containing block copolymer films. The rod-coil type silicon-containing block copolymer, polystyrene-b-polyisoprene with polyhedral oligomeric silsesquioxane (POSS) -modified side chains, was successfully synthesized by hydrosilation of polystyrene-b-poly(1,2-ran-3,4-isoprene) block copolymer with hydrido-heptacyclopentyl substituted POSS. The films were prepared from the polymer solution by casting on silicon wafers under a moist air flow. The self-organized micro-structures were investigated by electron microscopy. It was found that the hexagonally packed micropores and phase-separated nanodomains were formed within the films. Oxygen plasma etching of the films provided novel hierarchically ordered hybrid structures.

Original languageEnglish
Pages (from-to)567-576
Number of pages10
JournalPolymer Journal
Volume38
Issue number6
DOIs
Publication statusPublished - Aug 17 2006

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

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