Fabrication of hierarchically ordered hybrid structures over multiple length scales via direct etching of self-organized polyhedral oligomeric silsesquioxane (POSS) functionalized block copolymer films

Teruaki Hayakawa, Makoto Seino, Raita Goseki, Tomoyasu Hirai, Ryohei Kikuchi, Masa Aki Kakimoto, Masatoshi Tokita, Hideaki Yokoyama, Shin Horiuchi

Research output: Contribution to journal › Article › peer-review

28 Citations (Scopus)

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