Fabrication of hierarchically ordered hybrid structures over multiple length scales via direct etching of self-organized polyhedral oligomeric silsesquioxane (POSS) functionalized block copolymer films
Teruaki Hayakawa, Makoto Seino, Raita Goseki, Tomoyasu Hirai, Ryohei Kikuchi, Masa Aki Kakimoto, Masatoshi Tokita, Hideaki Yokoyama, Shin Horiuchi
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