Fabrication of ion-cosubstituted bismuth titanate thin films by chemical solution deposition method

Hiroshi Uchida, Isao Okada, Hirofumi Matsuda, Takashi Iijima, Takayuki Watanabe, Hiroshi Funakubo

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Ferroelectric properties of ion-cosubstituted BIT thin films, (Bi 4.00-yLny)4-δ (Ti3.00-xX x)3O12 (BLnTX), with various lanthanoid (Ln: e.g., La3+, Nd3+, Pr3+, Sm3+) and higher-valent ions (X: e.g., V5+, Nb5+, Ta5+, W6+) were investigated to determine the optimum condition of the ion-cosubstitution. Ion-substituted BIT films were fabricated on (111)Pt/Ti/SiO2/(100)Si substrates using a chemical solution deposition (CSD) technique. In the case of Bi-site substitution, Pr 3+, Nd3+ and Sm3+-substituted BIT films (BPT, BNT and BST) had larger remanent polarization (Pr) values than that of conventional La3+-substituted BIT film (BLT). Especially, P r and Ec values of (Bi3.50Nd 0.50)Ti3.00O12 film were measured to be 32 μC/cm2 and 126 kV/cm, respectively. On the other hand, Ti-site substitution by higher-valent cations degraded the large leakage current density of the BIT film from ∼10-6 down to ∼10-7 A/cm2. V-substituted (Bi3.50Nd0.50)Ti 3.00O12 films, i.e., Nd3+/V5+- cosubstituted BIT films (BNTV), had larger Pr values than that of non-substituted (Bi3.50Nd0.50)Ti3.00O 12 film. (Bi3.49Nd0.50)(Ti2.97V 0.03)O12 film possessed Pr and Ec values of 37 μC/cm2 and 119 kV/cm respectively, which were comparable with those of conventional Pb-based ferroelectric thin films like lead zirconate titanate, Pb(Zr,Ti)O3.

Original languageEnglish
Pages (from-to)41-54
Number of pages14
JournalIntegrated Ferroelectrics
Volume52
DOIs
Publication statusPublished - Dec 1 2003

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Bismuth
bismuth
Ions
Fabrication
Thin films
fabrication
thin films
ions
polarization
Polarization
Substitution reactions
substitutes
bismuth titanate
Ferroelectric thin films
Lanthanoid Series Elements
Remanence
Leakage currents
Ferroelectric materials
2-(4-ethoxybenzyl)-1-diethylaminoethyl-5-isothiocyanatobenzimidazole
Cations

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Control and Systems Engineering
  • Ceramics and Composites
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Fabrication of ion-cosubstituted bismuth titanate thin films by chemical solution deposition method. / Uchida, Hiroshi; Okada, Isao; Matsuda, Hirofumi; Iijima, Takashi; Watanabe, Takayuki; Funakubo, Hiroshi.

In: Integrated Ferroelectrics, Vol. 52, 01.12.2003, p. 41-54.

Research output: Contribution to journalArticle

Uchida, Hiroshi ; Okada, Isao ; Matsuda, Hirofumi ; Iijima, Takashi ; Watanabe, Takayuki ; Funakubo, Hiroshi. / Fabrication of ion-cosubstituted bismuth titanate thin films by chemical solution deposition method. In: Integrated Ferroelectrics. 2003 ; Vol. 52. pp. 41-54.
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AU - Uchida, Hiroshi

AU - Okada, Isao

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AU - Watanabe, Takayuki

AU - Funakubo, Hiroshi

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AB - Ferroelectric properties of ion-cosubstituted BIT thin films, (Bi 4.00-yLny)4-δ (Ti3.00-xX x)3O12 (BLnTX), with various lanthanoid (Ln: e.g., La3+, Nd3+, Pr3+, Sm3+) and higher-valent ions (X: e.g., V5+, Nb5+, Ta5+, W6+) were investigated to determine the optimum condition of the ion-cosubstitution. Ion-substituted BIT films were fabricated on (111)Pt/Ti/SiO2/(100)Si substrates using a chemical solution deposition (CSD) technique. In the case of Bi-site substitution, Pr 3+, Nd3+ and Sm3+-substituted BIT films (BPT, BNT and BST) had larger remanent polarization (Pr) values than that of conventional La3+-substituted BIT film (BLT). Especially, P r and Ec values of (Bi3.50Nd 0.50)Ti3.00O12 film were measured to be 32 μC/cm2 and 126 kV/cm, respectively. On the other hand, Ti-site substitution by higher-valent cations degraded the large leakage current density of the BIT film from ∼10-6 down to ∼10-7 A/cm2. V-substituted (Bi3.50Nd0.50)Ti 3.00O12 films, i.e., Nd3+/V5+- cosubstituted BIT films (BNTV), had larger Pr values than that of non-substituted (Bi3.50Nd0.50)Ti3.00O 12 film. (Bi3.49Nd0.50)(Ti2.97V 0.03)O12 film possessed Pr and Ec values of 37 μC/cm2 and 119 kV/cm respectively, which were comparable with those of conventional Pb-based ferroelectric thin films like lead zirconate titanate, Pb(Zr,Ti)O3.

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