Fabrication of microcantilever with a silicon tip prepared by anodization

Katsuya Higa, Tanemasa Asano

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The fabrication process of a microcantilever with a silicon tip prepared by anodization for an atomic force microscope(AFM) is demonstrated. The silicon tip having a high aspect ratio can be prepared using preferential anodization of a silicon wafer with n / p junction. The microcantilever is fabricated by patterning a silicon nitride film deposited on the anodized wafer. The silicon tip is examined by observing the surface morphology of an anisotropically etched silicon step and the grains of a vacuum evaporated Au film.

Original languageEnglish
Pages (from-to)7078-7080
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Volume37
Issue number12 B
Publication statusPublished - 1998
Externally publishedYes

Fingerprint

Fabrication
Silicon
fabrication
silicon
wafers
Silicon nitride
Silicon wafers
Surface morphology
Aspect ratio
high aspect ratio
Microscopes
p-n junctions
silicon nitrides
Vacuum
microscopes
vacuum

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Fabrication of microcantilever with a silicon tip prepared by anodization. / Higa, Katsuya; Asano, Tanemasa.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, Vol. 37, No. 12 B, 1998, p. 7078-7080.

Research output: Contribution to journalArticle

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