The fabrication process of a microcantilever with a silicon tip prepared by anodization for an atomic force microscope(AFM) is demonstrated. The silicon tip having a high aspect ratio can be prepared using preferential anodization of a silicon wafer with n / p junction. The microcantilever is fabricated by patterning a silicon nitride film deposited on the anodized wafer. The silicon tip is examined by observing the surface morphology of an anisotropically etched silicon step and the grains of a vacuum evaporated Au film.
|Number of pages||3|
|Journal||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|Issue number||12 B|
|Publication status||Published - 1998|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)