Abstract
The fabrication process of a microcantilever with a silicon tip prepared by anodization for an atomic force microscope(AFM) is demonstrated. The silicon tip having a high aspect ratio can be prepared using preferential anodization of a silicon wafer with n / p junction. The microcantilever is fabricated by patterning a silicon nitride film deposited on the anodized wafer. The silicon tip is examined by observing the surface morphology of an anisotropically etched silicon step and the grains of a vacuum evaporated Au film.
Original language | English |
---|---|
Pages (from-to) | 7078-7080 |
Number of pages | 3 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 37 |
Issue number | 12 B |
DOIs | |
Publication status | Published - 1998 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)