Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist

T. Ito, R. Sawada, E. Higurashi, T. Kiyokura

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A method for fabricating a microstructure with a high aspect ratio has been developed. It uses a combination of fluorinated polyimide and silicone-based positive photoresist, which reduces the number of process steps and the turn-around time. This fabrication method is applicable to optical micromachines and IC probes.

Original languageEnglish
Pages (from-to)165-168
Number of pages4
JournalMicrosystem Technologies
Volume6
Issue number5
DOIs
Publication statusPublished - Aug 2000

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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