Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist

T. Ito, R. Sawada, E. Higurashi, T. Kiyokura

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    A method for fabricating a microstructure with a high aspect ratio has been developed. It uses a combination of fluorinated polyimide and silicone-based positive photoresist, which reduces the number of process steps and the turn-around time. This fabrication method is applicable to optical micromachines and IC probes.

    Original languageEnglish
    Pages (from-to)165-168
    Number of pages4
    JournalMicrosystem Technologies
    Volume6
    Issue number5
    DOIs
    Publication statusPublished - Aug 2000

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Hardware and Architecture
    • Electrical and Electronic Engineering

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