Fabrication of nanofins of TiO2 and other metal oxides via the surface sol-gel process and selective dry etching

Rie Takaki, Hiromi Takemoto, Shigenori Fujikawa, Kunitake Toyoki

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

We herein report the fabrication of nanofins of TiO2 and other metal oxides via photolithography and the surface sol-gel process. A photolithographically fabricated line template on a silicon wafer was coated with a metal oxide nanolayer by the surface sol-gel process. In this study, TiO2, ZrO2, HfO2, SiO2/TiO2 and were employed as coating materials. Then, the topmost portion of the coating layer and the template were successively removed using CHF3 and oxygen plasma, respectively, leaving the sidewalls of the meal oxide layers remaining on the substrate. These fins were self-supporting, and the composition and the inner layer structure of metal oxide walls were controlled by changing the materials and the coating sequence. In the case of TiO2, the height/width ratio of the fin was 13.2 at the 30-cycle coating and is surprisingly high when compared to that of the conventional photolithography processes.

Original languageEnglish
Pages (from-to)227-232
Number of pages6
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume321
Issue number1-3
DOIs
Publication statusPublished - May 15 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Fingerprint Dive into the research topics of 'Fabrication of nanofins of TiO<sub>2</sub> and other metal oxides via the surface sol-gel process and selective dry etching'. Together they form a unique fingerprint.

Cite this