TY - JOUR
T1 - Fabrication of nanoparticle composite porous films having ultralow dielectric constant
AU - Nunomura, Shota
AU - Koga, Kazunori
AU - Shiratani, Masaharu
AU - Watanabe, Yukio
AU - Morisada, Yoshinori
AU - Matsuki, Nobuo
AU - Ikeda, Shingo
PY - 2005/12/16
Y1 - 2005/12/16
N2 - Nanoparticle composite porous films having a dielectric constant of ε, = 1.7-3.5 have been deposited using plasma chemical vapor deposition. Nanoparticles as nano-building blocks and radicals as adhesives are generated in plasmas, and nanoparticles are deposited together with radicals on substrates to form porous films. Nano-sized pores are dispersed in the films and their dielectric constants are controlled by the concentrations of pores, i.e., their porosities. The method is applicable to depositing nanoparticle composite porous films for other applications.
AB - Nanoparticle composite porous films having a dielectric constant of ε, = 1.7-3.5 have been deposited using plasma chemical vapor deposition. Nanoparticles as nano-building blocks and radicals as adhesives are generated in plasmas, and nanoparticles are deposited together with radicals on substrates to form porous films. Nano-sized pores are dispersed in the films and their dielectric constants are controlled by the concentrations of pores, i.e., their porosities. The method is applicable to depositing nanoparticle composite porous films for other applications.
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U2 - 10.1143/JJAP.44.L1509
DO - 10.1143/JJAP.44.L1509
M3 - Article
AN - SCOPUS:31844432173
VL - 44
SP - L1509-L1511
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
SN - 0021-4922
IS - 50-52
ER -