Fabrication of nanoparticle composite porous films having ultralow dielectric constant

Shota Nunomura, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Yoshinori Morisada, Nobuo Matsuki, Shingo Ikeda

Research output: Contribution to journalArticlepeer-review

42 Citations (Scopus)


Nanoparticle composite porous films having a dielectric constant of ε, = 1.7-3.5 have been deposited using plasma chemical vapor deposition. Nanoparticles as nano-building blocks and radicals as adhesives are generated in plasmas, and nanoparticles are deposited together with radicals on substrates to form porous films. Nano-sized pores are dispersed in the films and their dielectric constants are controlled by the concentrations of pores, i.e., their porosities. The method is applicable to depositing nanoparticle composite porous films for other applications.

Original languageEnglish
Pages (from-to)L1509-L1511
JournalJapanese Journal of Applied Physics, Part 2: Letters
Issue number50-52
Publication statusPublished - Dec 16 2005

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)


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