Fabrication of nanopillar micropatterns by hybrid mask lithography for surface-directed liquid flow

Shinya Sakuma, Masakuni Sugita, Fumihito Arai

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

This paper presents a novel method for fabricating nanopillar micropatterns for surface-directed liquid flows. It employs hybrid mask lithography, which uses a mask consisting of a combination of a photoresist and nanoparticles in the photolithography process. The nanopillar density is controlled by varying the weight ratio of nanoparticles in the composite mask. Hybrid mask lithography was used to fabricate a surface-directed liquid flow. The effect of the surface-directed liquid flow, which was formed by the air-liquid interface due to nanopillar micropatterns, was evaluated, and the results show that the oscillation of microparticles, when the micro-tool was actuated, was dramatically reduced by using a surface-directed liquid flow. Moreover, the target particle was manipulated individually without non-oscillating ambient particles.

Original languageEnglish
Pages (from-to)232-242
Number of pages11
JournalMicromachines
Volume4
Issue number2
DOIs
Publication statusPublished - 2013
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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