Fabrication of on-chip microcapillary using photosensitive glass

S. Etoh, T. Fujimura, Reiji Hattori, Y. Kuroki

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The on-chip microcapillary applying for electrophoresis analysis device has been fabricated on photosensitive glass. This process can make a high aspect-ratio channel structure. The channel-depth can be controlled by varying wet-etching time without widening the channel width because the substrate material has vertical high etch rate selectivity. This high aspect-ratio structure obtains a long optical path and appropriate sample volume resulting in high-sensitivity for various analyses. The fabrication process is simpler than a usual glass micromachining process because of photo-resistless lithography process. In order to smooth the channel surface and to attach a cover glass onto the substrate, a polysilazane coating process is proposed and revealed to be effective.

Original languageEnglish
Pages (from-to)541-545
Number of pages5
JournalMicrosystem Technologies
Volume9
Issue number8
DOIs
Publication statusPublished - Oct 1 2003

Fingerprint

Photosensitive glass
Aspect ratio
chips
Fabrication
Glass
fabrication
Wet etching
glass
Micromachining
Substrates
high aspect ratio
Electrophoresis
Lithography
Coatings
electrophoresis
micromachining
optical paths
coating
lithography
selectivity

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Instrumentation

Cite this

Fabrication of on-chip microcapillary using photosensitive glass. / Etoh, S.; Fujimura, T.; Hattori, Reiji; Kuroki, Y.

In: Microsystem Technologies, Vol. 9, No. 8, 01.10.2003, p. 541-545.

Research output: Contribution to journalArticle

Etoh, S. ; Fujimura, T. ; Hattori, Reiji ; Kuroki, Y. / Fabrication of on-chip microcapillary using photosensitive glass. In: Microsystem Technologies. 2003 ; Vol. 9, No. 8. pp. 541-545.
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