Fabrication of open-top microchannel plate using deep X-ray exposure mask made with silicon on insulator substrate

Tsuyoshi Fujimura, Akihiro Ikeda, Shin Ichi Etoh, Reiji Hattori, Yukinori Kuroki, Suk Sang Chang

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

We propose a high-aspect-ratio open-top microchannel plate structure. This type of microchannel plate has many advantages in electrophoresis. The plate was fabricated by deep X-ray lithography using synchrotron radiation (SR) light and the chemical wet etching process. A deep X-ray exposure mask was fabricated with a silicon on insulator (SOI) substrate. The patterned Si microstructure was micromachined into a thin Si membrane and a thick Au X-ray absorber was embedded in it by electroplating. A plastic material, polymethylmethacrylate (PMMA) was used for the plate substrate. For reduction of the exposure time and high-aspect-ratio fast wet development, the fabrication condition was optimized with respect to not the exposure dose but to the PMMA mean molecular weight (M.W.) changing after deep X-ray exposure as measured by gel permeation chromatography (GPC). Decrement of the PMMA M.W. and increment of the wet developer temperature accelerated the etching rate. Under optimized fabrication conditions, a microchannel with 50 μm width through 1000 μm PMMA plate, with a high aspect ratio over 20, was fabricated. By using a high-aspect-ratio open-top microchannel plate, high fluorescent electrophoresis was performed.

Original languageEnglish
Pages (from-to)4102-4106
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Volume42
Issue number6 B
Publication statusPublished - Jun 2003

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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