Fabrication of PblnAu Josephson Tunnel Junctions and Evaluation of their Basic Properties

Naoto Uchida, Keiji Enpuku, Fujio Irie, Keiji Yoshida

Research output: Contribution to journalArticle

Abstract

PblnAu Josephson tunnel junctions are fabricated by RF plasma oxidation procedure, and their properties are investigated quantitatively in order to diagnose junctions. From the comparison between theory and experiment of dc current-voltage characteristics, some basic parameters of the junction are obtained. The relation between junction parameters and the oxide barrier is also discussed from the change of junction parameters due to the aging effect. Futhermore, a method is given to determine the distribution of the critical current density from the dc current-voltage characteristic, and a uniformity of the oxide barrier is discussed by using this method.

Original languageEnglish
Pages (from-to)613-623
Number of pages11
JournalShinku
Volume25
Issue number9
DOIs
Publication statusPublished - Jan 1982

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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