We herein report the fabrication of 3D-structured silicon oxide ultrathin film from nano-sized line patterns on solid substrate and its separation from the solid substrate. After spin-coating of the polymer underlayer on a silicon wafer, organic nanoholes are fabricated by photo-lithography technique. Its surfaces were covered with ultrathin silicon oxide layers(thickness, 20 to 30 nm) by the surface sol-gel process. The silica film was separated from the substrate by dissolving the polymer underlayer in 2-ethoxyethanol and transferred onto alumina membrane. After calcination (500°C, 5h), 3D-structured silicon oxide ultrathin film was observed by SEM, and they preserved the shape of the original template structure. Shape-designed nano architectures become available by the nanocopy approach.
|Number of pages||1|
|Publication status||Published - 2005|
|Event||54th SPSJ Annual Meeting 2005 - Yokohama, Japan|
Duration: May 25 2005 → May 27 2005
|Other||54th SPSJ Annual Meeting 2005|
|Period||5/25/05 → 5/27/05|
All Science Journal Classification (ASJC) codes