Fabrication of self-supporting nanoarchitecture composed of ultrathin SiO2 films by nano copying

Shigenori Fujikawa, Rie Takaki, Toyoki Kunitake

Research output: Contribution to conferencePaper

Abstract

We herein report the fabrication of 3D-structured silicon oxide ultrathin film from nano-sized line patterns on solid substrate and its separation from the solid substrate. After spin-coating of the polymer underlayer on a silicon wafer, organic nanoholes are fabricated by photo-lithography technique. Its surfaces were covered with ultrathin silicon oxide layers(thickness, 20 to 30 nm) by the surface sol-gel process. The silica film was separated from the substrate by dissolving the polymer underlayer in 2-ethoxyethanol and transferred onto alumina membrane. After calcination (500°C, 5h), 3D-structured silicon oxide ultrathin film was observed by SEM, and they preserved the shape of the original template structure. Shape-designed nano architectures become available by the nanocopy approach.

Original languageEnglish
Number of pages1
Publication statusPublished - 2005
Externally publishedYes
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: May 25 2005May 27 2005

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period5/25/055/27/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Fujikawa, S., Takaki, R., & Kunitake, T. (2005). Fabrication of self-supporting nanoarchitecture composed of ultrathin SiO2 films by nano copying. Paper presented at 54th SPSJ Annual Meeting 2005, Yokohama, Japan.