Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Tomoyuki Koga, Hideyuki Otsuka, Atsushi Takahara

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

Original languageEnglish
Pages (from-to)1196-1197
Number of pages2
JournalChemistry Letters
Issue number12
DOIs
Publication statusPublished - Dec 5 2002

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Photolithography
Monolayers
Fabrication
Scanning
Substrates

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

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Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process. / Koga, Tomoyuki; Otsuka, Hideyuki; Takahara, Atsushi.

In: Chemistry Letters, No. 12, 05.12.2002, p. 1196-1197.

Research output: Contribution to journalArticle

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