Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Tomoyuki Koga; Hideyuki Otsuka; Atsushi Takahara

doi:10.1246/cl.2002.1196

Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Tomoyuki Koga, Hideyuki Otsuka, Atsushi Takahara

Department of Applied Molecular Chemistry

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

Original language	English
Pages (from-to)	1196-1197
Number of pages	2
Journal	Chemistry Letters
Issue number	12
DOIs	https://doi.org/10.1246/cl.2002.1196
Publication status	Published - Dec 5 2002

All Science Journal Classification (ASJC) codes

Chemistry(all)

Access to Document

10.1246/cl.2002.1196

Cite this

@article{0ac936472fc142d58fc77863745289eb,

title = "Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process",

abstract = "Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.",

author = "Tomoyuki Koga and Hideyuki Otsuka and Atsushi Takahara",

year = "2002",

month = dec,

day = "5",

doi = "10.1246/cl.2002.1196",

language = "English",

pages = "1196--1197",

journal = "Chemistry Letters",

issn = "0366-7022",

publisher = "The Chemical Society of Japan",

number = "12",

}

TY - JOUR

T1 - Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

AU - Koga, Tomoyuki

AU - Otsuka, Hideyuki

AU - Takahara, Atsushi

PY - 2002/12/5

Y1 - 2002/12/5

N2 - Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

AB - Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

UR - http://www.scopus.com/inward/record.url?scp=0037028331&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037028331&partnerID=8YFLogxK

U2 - 10.1246/cl.2002.1196

DO - 10.1246/cl.2002.1196

M3 - Article

AN - SCOPUS:0037028331

SP - 1196

EP - 1197

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 12

ER -

Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this