Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Tomoyuki Koga; Hideyuki Otsuka; Atsushi Takahara

doi:10.1246/cl.2002.1196

Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Tomoyuki Koga, Hideyuki Otsuka, Atsushi Takahara

Department of Applied Molecular Chemistry

Research output: Contribution to journal › Article › peer-review

17 Citations (Scopus)

Abstract

Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

Original language	English
Pages (from-to)	1196-1197
Number of pages	2
Journal	Chemistry Letters
Issue number	12
DOIs	https://doi.org/10.1246/cl.2002.1196
Publication status	Published - Dec 5 2002

All Science Journal Classification (ASJC) codes

Chemistry(all)

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10.1246/cl.2002.1196

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title = "Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process",

abstract = "Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.",

author = "Tomoyuki Koga and Hideyuki Otsuka and Atsushi Takahara",

year = "2002",

month = dec,

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doi = "10.1246/cl.2002.1196",

language = "English",

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journal = "Chemistry Letters",

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publisher = "The Chemical Society of Japan",

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AU - Koga, Tomoyuki

AU - Otsuka, Hideyuki

AU - Takahara, Atsushi

PY - 2002/12/5

Y1 - 2002/12/5

N2 - Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

AB - Three-component micropatterned organosilane monolayer was successfully fabricated on Si-wafer substrate by a stepwise photolithography process. Scanning force microscopic observations revealed that three kinds of organosilane monolayers with different physicochemical properties were area-selectively immobilized on a Si wafer.

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JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

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Fabrication of three-component micropatterned organosilane monolayer by a stepwise photolithography process

Abstract

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