Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method

Terumitsu Tanaka, Hiroki Kurisu, Mitsuru Matsuura, Yoshihiro Shimosato, Shigenobu Okada, Kazunori Oshiro, Hirotaka Fujimori, Setsuo Yamamoto

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Well-crystallized Ni-Zn ferrite (Ni0.4 Zn0.6 Fe2 O4) highly oriented ultrathin films were obtained at a substrate temperature of 200 °C by a reactive sputtering method utilizing electron cyclotron resonance microwave plasma, which is very effective to crystallize oxide or nitride materials without heat treatment. Thin films of Ni-Zn ferrite deposited on a MgO (100) underlayer showed an intense X-ray-diffraction peak of (400) from the Ni-Zn ferrite as compared to similar films deposited directly onto thermally oxidized Si substrates. A 1.5-nm-thick Ni-Zn ferrite film, which corresponds to twice the lattice constant for bulk Ni-Zn ferrite, crystallized on a MgO (100) underlayer.

Original languageEnglish
Article number08N507
JournalJournal of Applied Physics
Volume99
Issue number8
DOIs
Publication statusPublished - May 25 2006
Externally publishedYes

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electron cyclotron resonance
ferrites
sputtering
fabrication
nitrides
heat treatment
microwaves
oxides
thin films
diffraction
x rays
temperature

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Tanaka, T., Kurisu, H., Matsuura, M., Shimosato, Y., Okada, S., Oshiro, K., ... Yamamoto, S. (2006). Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method. Journal of Applied Physics, 99(8), [08N507]. https://doi.org/10.1063/1.2169538

Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method. / Tanaka, Terumitsu; Kurisu, Hiroki; Matsuura, Mitsuru; Shimosato, Yoshihiro; Okada, Shigenobu; Oshiro, Kazunori; Fujimori, Hirotaka; Yamamoto, Setsuo.

In: Journal of Applied Physics, Vol. 99, No. 8, 08N507, 25.05.2006.

Research output: Contribution to journalArticle

Tanaka, T, Kurisu, H, Matsuura, M, Shimosato, Y, Okada, S, Oshiro, K, Fujimori, H & Yamamoto, S 2006, 'Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method', Journal of Applied Physics, vol. 99, no. 8, 08N507. https://doi.org/10.1063/1.2169538
Tanaka, Terumitsu ; Kurisu, Hiroki ; Matsuura, Mitsuru ; Shimosato, Yoshihiro ; Okada, Shigenobu ; Oshiro, Kazunori ; Fujimori, Hirotaka ; Yamamoto, Setsuo. / Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method. In: Journal of Applied Physics. 2006 ; Vol. 99, No. 8.
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