Fabrication processing of Y123 coated conductors by MOD-TFA method

Tetsuji Honjo, Hiroshi Fuji, Yuichi Nakamura, Teruo Izumi, Yuh Shiohara, Yasuhiro Iijima, Takashi Saitoh, Ryo Teranishi, Masahiro Yoshimura

Research output: Contribution to journalArticle

Abstract

A MOD-TFA process using the multi-coating method was applied to form thicker Y123 films on LaAlO3 substrates, and the dependence of the low partial pressure of H2O, P(H2O), for Y123 growth was investigated. As a result, it was found that the crystal alignment of thicker Y123 films could be improved by optimizing the P(H2O). In particular, for a thicker film, it was found that low P(H2O) during the Y123 growth is effective in maintaining expitaxial growth. Consequently, the critical current value for 0.01 m wide (Ic*) of the triple-coated film was increased from 11 kA/m-width to 28 kA/m-width in comparison with that of the single-coated film. Further, it was confirmed that the high in-plane aligned buffer layers is necessary to obtain a high critical current density (Jc) film on a metal substrate. Subsequently, the heat treatment under the low P(H2O) was applied to the CeO2/IBAD-YSZ/Hastelloy substrates using the multi-coating method. The triple-coating Y123 film with 1 μm thickness on the metal substrate achieves the Jc value of 16 GA/m2 at 77.3 K in self fields and the Ic* performance of 15.3 kA/m-width.

Original languageEnglish
Pages (from-to)279-283
Number of pages5
JournalNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Volume66
Issue number4
DOIs
Publication statusPublished - Jan 1 2002
Externally publishedYes

Fingerprint

conductors
Thick films
thick films
Fabrication
fabrication
Substrates
Processing
Coatings
coating
critical current
Metals
Hastelloy (trademark)
Ion beam assisted deposition
Critical currents
Buffer layers
yttria-stabilized zirconia
Partial pressure
metals
partial pressure
heat treatment

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry

Cite this

Honjo, T., Fuji, H., Nakamura, Y., Izumi, T., Shiohara, Y., Iijima, Y., ... Yoshimura, M. (2002). Fabrication processing of Y123 coated conductors by MOD-TFA method. Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals, 66(4), 279-283. https://doi.org/10.2320/jinstmet1952.66.4_279

Fabrication processing of Y123 coated conductors by MOD-TFA method. / Honjo, Tetsuji; Fuji, Hiroshi; Nakamura, Yuichi; Izumi, Teruo; Shiohara, Yuh; Iijima, Yasuhiro; Saitoh, Takashi; Teranishi, Ryo; Yoshimura, Masahiro.

In: Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals, Vol. 66, No. 4, 01.01.2002, p. 279-283.

Research output: Contribution to journalArticle

Honjo, T, Fuji, H, Nakamura, Y, Izumi, T, Shiohara, Y, Iijima, Y, Saitoh, T, Teranishi, R & Yoshimura, M 2002, 'Fabrication processing of Y123 coated conductors by MOD-TFA method', Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals, vol. 66, no. 4, pp. 279-283. https://doi.org/10.2320/jinstmet1952.66.4_279
Honjo, Tetsuji ; Fuji, Hiroshi ; Nakamura, Yuichi ; Izumi, Teruo ; Shiohara, Yuh ; Iijima, Yasuhiro ; Saitoh, Takashi ; Teranishi, Ryo ; Yoshimura, Masahiro. / Fabrication processing of Y123 coated conductors by MOD-TFA method. In: Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals. 2002 ; Vol. 66, No. 4. pp. 279-283.
@article{38396a6735ee4a2eaa5889ca02757f8b,
title = "Fabrication processing of Y123 coated conductors by MOD-TFA method",
abstract = "A MOD-TFA process using the multi-coating method was applied to form thicker Y123 films on LaAlO3 substrates, and the dependence of the low partial pressure of H2O, P(H2O), for Y123 growth was investigated. As a result, it was found that the crystal alignment of thicker Y123 films could be improved by optimizing the P(H2O). In particular, for a thicker film, it was found that low P(H2O) during the Y123 growth is effective in maintaining expitaxial growth. Consequently, the critical current value for 0.01 m wide (Ic*) of the triple-coated film was increased from 11 kA/m-width to 28 kA/m-width in comparison with that of the single-coated film. Further, it was confirmed that the high in-plane aligned buffer layers is necessary to obtain a high critical current density (Jc) film on a metal substrate. Subsequently, the heat treatment under the low P(H2O) was applied to the CeO2/IBAD-YSZ/Hastelloy substrates using the multi-coating method. The triple-coating Y123 film with 1 μm thickness on the metal substrate achieves the Jc value of 16 GA/m2 at 77.3 K in self fields and the Ic* performance of 15.3 kA/m-width.",
author = "Tetsuji Honjo and Hiroshi Fuji and Yuichi Nakamura and Teruo Izumi and Yuh Shiohara and Yasuhiro Iijima and Takashi Saitoh and Ryo Teranishi and Masahiro Yoshimura",
year = "2002",
month = "1",
day = "1",
doi = "10.2320/jinstmet1952.66.4_279",
language = "English",
volume = "66",
pages = "279--283",
journal = "Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals",
issn = "0021-4876",
publisher = "公益社団法人 日本金属学会",
number = "4",

}

TY - JOUR

T1 - Fabrication processing of Y123 coated conductors by MOD-TFA method

AU - Honjo, Tetsuji

AU - Fuji, Hiroshi

AU - Nakamura, Yuichi

AU - Izumi, Teruo

AU - Shiohara, Yuh

AU - Iijima, Yasuhiro

AU - Saitoh, Takashi

AU - Teranishi, Ryo

AU - Yoshimura, Masahiro

PY - 2002/1/1

Y1 - 2002/1/1

N2 - A MOD-TFA process using the multi-coating method was applied to form thicker Y123 films on LaAlO3 substrates, and the dependence of the low partial pressure of H2O, P(H2O), for Y123 growth was investigated. As a result, it was found that the crystal alignment of thicker Y123 films could be improved by optimizing the P(H2O). In particular, for a thicker film, it was found that low P(H2O) during the Y123 growth is effective in maintaining expitaxial growth. Consequently, the critical current value for 0.01 m wide (Ic*) of the triple-coated film was increased from 11 kA/m-width to 28 kA/m-width in comparison with that of the single-coated film. Further, it was confirmed that the high in-plane aligned buffer layers is necessary to obtain a high critical current density (Jc) film on a metal substrate. Subsequently, the heat treatment under the low P(H2O) was applied to the CeO2/IBAD-YSZ/Hastelloy substrates using the multi-coating method. The triple-coating Y123 film with 1 μm thickness on the metal substrate achieves the Jc value of 16 GA/m2 at 77.3 K in self fields and the Ic* performance of 15.3 kA/m-width.

AB - A MOD-TFA process using the multi-coating method was applied to form thicker Y123 films on LaAlO3 substrates, and the dependence of the low partial pressure of H2O, P(H2O), for Y123 growth was investigated. As a result, it was found that the crystal alignment of thicker Y123 films could be improved by optimizing the P(H2O). In particular, for a thicker film, it was found that low P(H2O) during the Y123 growth is effective in maintaining expitaxial growth. Consequently, the critical current value for 0.01 m wide (Ic*) of the triple-coated film was increased from 11 kA/m-width to 28 kA/m-width in comparison with that of the single-coated film. Further, it was confirmed that the high in-plane aligned buffer layers is necessary to obtain a high critical current density (Jc) film on a metal substrate. Subsequently, the heat treatment under the low P(H2O) was applied to the CeO2/IBAD-YSZ/Hastelloy substrates using the multi-coating method. The triple-coating Y123 film with 1 μm thickness on the metal substrate achieves the Jc value of 16 GA/m2 at 77.3 K in self fields and the Ic* performance of 15.3 kA/m-width.

UR - http://www.scopus.com/inward/record.url?scp=0036542831&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036542831&partnerID=8YFLogxK

U2 - 10.2320/jinstmet1952.66.4_279

DO - 10.2320/jinstmet1952.66.4_279

M3 - Article

AN - SCOPUS:0036542831

VL - 66

SP - 279

EP - 283

JO - Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

JF - Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

SN - 0021-4876

IS - 4

ER -