Facile fabrication of silver nanofin array via electroless plating

Kentaro Miyoshi, Yoshitaka Aoki, Toyoki Kunitake, Shigenori Fujikawa

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

The fabrication of metallic nanostructures is one of the main issues in nanotechnology. This article describes the fabrication of a silver nanofin array by combining microlithography, electroless plating, and an etching technique. Fabricated Ag nanofins have a high aspect ratio (height/width = 10, width = 60 nm, height = 600 nm), and their widths and heights can be controlled by the period of electroless plating and the height of the original line pattern. An isolated Ag nanofin was proven to show metallic electrical conductivity. The current process provides a rapid and shape-designable fabrication method of metallic nanostructures.

Original languageEnglish
Pages (from-to)4205-4208
Number of pages4
JournalLangmuir
Volume24
Issue number8
DOIs
Publication statusPublished - Apr 15 2008
Externally publishedYes

Fingerprint

Electroless plating
plating
Silver
silver
Fabrication
fabrication
Nanostructures
Nanotechnology
Lithography
Aspect ratio
Etching
nanotechnology
high aspect ratio
etching
electrical resistivity
nanofin

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

Facile fabrication of silver nanofin array via electroless plating. / Miyoshi, Kentaro; Aoki, Yoshitaka; Kunitake, Toyoki; Fujikawa, Shigenori.

In: Langmuir, Vol. 24, No. 8, 15.04.2008, p. 4205-4208.

Research output: Contribution to journalArticle

Miyoshi, Kentaro ; Aoki, Yoshitaka ; Kunitake, Toyoki ; Fujikawa, Shigenori. / Facile fabrication of silver nanofin array via electroless plating. In: Langmuir. 2008 ; Vol. 24, No. 8. pp. 4205-4208.
@article{6e78318f4d0d4ecaba158644ad181cfe,
title = "Facile fabrication of silver nanofin array via electroless plating",
abstract = "The fabrication of metallic nanostructures is one of the main issues in nanotechnology. This article describes the fabrication of a silver nanofin array by combining microlithography, electroless plating, and an etching technique. Fabricated Ag nanofins have a high aspect ratio (height/width = 10, width = 60 nm, height = 600 nm), and their widths and heights can be controlled by the period of electroless plating and the height of the original line pattern. An isolated Ag nanofin was proven to show metallic electrical conductivity. The current process provides a rapid and shape-designable fabrication method of metallic nanostructures.",
author = "Kentaro Miyoshi and Yoshitaka Aoki and Toyoki Kunitake and Shigenori Fujikawa",
year = "2008",
month = "4",
day = "15",
doi = "10.1021/la703512w",
language = "English",
volume = "24",
pages = "4205--4208",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "8",

}

TY - JOUR

T1 - Facile fabrication of silver nanofin array via electroless plating

AU - Miyoshi, Kentaro

AU - Aoki, Yoshitaka

AU - Kunitake, Toyoki

AU - Fujikawa, Shigenori

PY - 2008/4/15

Y1 - 2008/4/15

N2 - The fabrication of metallic nanostructures is one of the main issues in nanotechnology. This article describes the fabrication of a silver nanofin array by combining microlithography, electroless plating, and an etching technique. Fabricated Ag nanofins have a high aspect ratio (height/width = 10, width = 60 nm, height = 600 nm), and their widths and heights can be controlled by the period of electroless plating and the height of the original line pattern. An isolated Ag nanofin was proven to show metallic electrical conductivity. The current process provides a rapid and shape-designable fabrication method of metallic nanostructures.

AB - The fabrication of metallic nanostructures is one of the main issues in nanotechnology. This article describes the fabrication of a silver nanofin array by combining microlithography, electroless plating, and an etching technique. Fabricated Ag nanofins have a high aspect ratio (height/width = 10, width = 60 nm, height = 600 nm), and their widths and heights can be controlled by the period of electroless plating and the height of the original line pattern. An isolated Ag nanofin was proven to show metallic electrical conductivity. The current process provides a rapid and shape-designable fabrication method of metallic nanostructures.

UR - http://www.scopus.com/inward/record.url?scp=42449114037&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=42449114037&partnerID=8YFLogxK

U2 - 10.1021/la703512w

DO - 10.1021/la703512w

M3 - Article

C2 - 18312009

AN - SCOPUS:42449114037

VL - 24

SP - 4205

EP - 4208

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 8

ER -