Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns

Chang Dae Keum, Takashi Fukuda, Him Matsuda, Kaoru Tamada

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A fabrication method for submicrometor-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricatcd pattern has been achieved, well below the wavelength of incident light. After anneating at 200°C for 40 min. the pattern worked as an electric wire with a resistivity of -8 × 104 Ω cm.

Original languageEnglish
Pages (from-to)696-699+666
JournalAdvanced Materials
Volume16
Issue number8
Publication statusPublished - Apr 19 2004
Externally publishedYes

Fingerprint

Electric wire
Full width at half maximum
Polymers
Nanoparticles
Fabrication
Wavelength
Composite materials
Substrates
furan

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns. / Keum, Chang Dae; Fukuda, Takashi; Matsuda, Him; Tamada, Kaoru.

In: Advanced Materials, Vol. 16, No. 8, 19.04.2004, p. 696-699+666.

Research output: Contribution to journalArticle

Keum, Chang Dae ; Fukuda, Takashi ; Matsuda, Him ; Tamada, Kaoru. / Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns. In: Advanced Materials. 2004 ; Vol. 16, No. 8. pp. 696-699+666.
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