Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns

Chang Dae Keum, Takashi Fukuda, Him Matsuda, Kaoru Tamada

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A fabrication method for submicrometor-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricatcd pattern has been achieved, well below the wavelength of incident light. After anneating at 200°C for 40 min. the pattern worked as an electric wire with a resistivity of -8 × 104 Ω cm.

Original languageEnglish
Pages (from-to)696-699
Number of pages4
JournalAdvanced Materials
Volume16
Issue number8
DOIs
Publication statusPublished - Apr 19 2004
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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