Fast diffusion of water molecules into chemically modified sio2 films formed by chemical vapor deposition

Atsushi Ohtake, Kinya Kobayashi, Syuhei Kurokawa, Osamu Ohnishi, Toshiro Doi

Research output: Contribution to journalArticlepeer-review

Abstract

We investigated water permeation properties into silicon oxide (SiO 2) and chemically modified SiO 2 films. The water permeability of fluorinated SiO 2 (SiOF) is higher than that of SiO 2, indicating that SiOF may have fast diffusion paths constructed from SiOF structures formed by the breaking of SiOSi networks by F atoms. It is suggested that the presence of these fast diffusion paths can explain the reason for the high water permeability of various kinds of SiOF and other low-k films.

Original languageEnglish
Pages (from-to)60-61
Number of pages2
JournalChemistry Letters
Volume41
Issue number1
DOIs
Publication statusPublished - Jan 6 2012

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

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