Ferroelectricity of nondoped thin HfO2 films in TiN/HfO2/TiN stacks

Tomonori Nishimura, Lun Xu, Shigehisa Shibayama, Takeaki Yajima, Shinji Migita, Akira Toriumi

Research output: Contribution to journalArticlepeer-review

68 Citations (Scopus)

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