We have investigated the feasibility of nano-pillarets prepared by a reactive ion etching (RIE) with oxygen gas of organic materials for application to a field electron emitter. Photoresist, polyimide, ion-beam modified photoresist, and high purity carbon were used as test materials. A plasma reactor and RIE equipment were used to fabricate the nano-pillarets. It was found that the damage of oxygen ion irradiation at the surface of the organic material was required to form nano-pillarets. Field emission characteristics were measured with a diode structure. It was found that conductive nano-pillarets emit electrons at rather low-voltage. Field emission current of the order of 10-6 A was obtained from nano-pillarets made from the ion-beam modified photoresist. The emission current fluctuation of 20% was obtained.
|Number of pages||4|
|Journal||SID Conference Record of the International Display Research Conference|
|Publication status||Published - Dec 1 2001|
|Event||Asia Display/IDW 2001 - Nagoya, Japan|
Duration: Oct 16 2002 → Oct 19 2002
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering