Field emission from metal-particle bound with a photoresist

Akiyoshi Baba, Tanemasa Asano

Research output: Contribution to conferencePaper

Abstract

We propose a film composed of metal particles for use in field electron emitter material on a large substrate. Test films were prepared on a silicon substrate from a mixture of palladium fine particles and positive tone photoresist. It was found that the photoresist at the surface was acted as a barrier for electrons emission. It was also found that the emission current abruptly increases with time evolution applying a constant voltage. After this phenomenon, the threshold voltage for electron emission was drastically decreased and the emission current became stable.

Original languageEnglish
Pages235-236
Number of pages2
Publication statusPublished - Dec 1 2001
EventProceedings of the 14th International Vacuum Microelectronics Conference - Davis, CA, United States
Duration: Aug 12 2001Aug 16 2001

Other

OtherProceedings of the 14th International Vacuum Microelectronics Conference
CountryUnited States
CityDavis, CA
Period8/12/018/16/01

Fingerprint

metal particles
photoresists
electron emission
field emission
threshold voltage
palladium
emitters
electric potential
silicon
electrons

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces

Cite this

Baba, A., & Asano, T. (2001). Field emission from metal-particle bound with a photoresist. 235-236. Paper presented at Proceedings of the 14th International Vacuum Microelectronics Conference, Davis, CA, United States.

Field emission from metal-particle bound with a photoresist. / Baba, Akiyoshi; Asano, Tanemasa.

2001. 235-236 Paper presented at Proceedings of the 14th International Vacuum Microelectronics Conference, Davis, CA, United States.

Research output: Contribution to conferencePaper

Baba, A & Asano, T 2001, 'Field emission from metal-particle bound with a photoresist', Paper presented at Proceedings of the 14th International Vacuum Microelectronics Conference, Davis, CA, United States, 8/12/01 - 8/16/01 pp. 235-236.
Baba A, Asano T. Field emission from metal-particle bound with a photoresist. 2001. Paper presented at Proceedings of the 14th International Vacuum Microelectronics Conference, Davis, CA, United States.
Baba, Akiyoshi ; Asano, Tanemasa. / Field emission from metal-particle bound with a photoresist. Paper presented at Proceedings of the 14th International Vacuum Microelectronics Conference, Davis, CA, United States.2 p.
@conference{9cb745e16d8d409f924803567b9f653b,
title = "Field emission from metal-particle bound with a photoresist",
abstract = "We propose a film composed of metal particles for use in field electron emitter material on a large substrate. Test films were prepared on a silicon substrate from a mixture of palladium fine particles and positive tone photoresist. It was found that the photoresist at the surface was acted as a barrier for electrons emission. It was also found that the emission current abruptly increases with time evolution applying a constant voltage. After this phenomenon, the threshold voltage for electron emission was drastically decreased and the emission current became stable.",
author = "Akiyoshi Baba and Tanemasa Asano",
year = "2001",
month = "12",
day = "1",
language = "English",
pages = "235--236",
note = "Proceedings of the 14th International Vacuum Microelectronics Conference ; Conference date: 12-08-2001 Through 16-08-2001",

}

TY - CONF

T1 - Field emission from metal-particle bound with a photoresist

AU - Baba, Akiyoshi

AU - Asano, Tanemasa

PY - 2001/12/1

Y1 - 2001/12/1

N2 - We propose a film composed of metal particles for use in field electron emitter material on a large substrate. Test films were prepared on a silicon substrate from a mixture of palladium fine particles and positive tone photoresist. It was found that the photoresist at the surface was acted as a barrier for electrons emission. It was also found that the emission current abruptly increases with time evolution applying a constant voltage. After this phenomenon, the threshold voltage for electron emission was drastically decreased and the emission current became stable.

AB - We propose a film composed of metal particles for use in field electron emitter material on a large substrate. Test films were prepared on a silicon substrate from a mixture of palladium fine particles and positive tone photoresist. It was found that the photoresist at the surface was acted as a barrier for electrons emission. It was also found that the emission current abruptly increases with time evolution applying a constant voltage. After this phenomenon, the threshold voltage for electron emission was drastically decreased and the emission current became stable.

UR - http://www.scopus.com/inward/record.url?scp=0035784496&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035784496&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0035784496

SP - 235

EP - 236

ER -