Field emission from metal-particle bound with a photoresist

Akiyoshi Baba, Tanemasa Asano

Research output: Contribution to conferencePaperpeer-review

Abstract

We propose a film composed of metal particles for use in field electron emitter material on a large substrate. Test films were prepared on a silicon substrate from a mixture of palladium fine particles and positive tone photoresist. It was found that the photoresist at the surface was acted as a barrier for electrons emission. It was also found that the emission current abruptly increases with time evolution applying a constant voltage. After this phenomenon, the threshold voltage for electron emission was drastically decreased and the emission current became stable.

Original languageEnglish
Pages235-236
Number of pages2
Publication statusPublished - Dec 1 2001
EventProceedings of the 14th International Vacuum Microelectronics Conference - Davis, CA, United States
Duration: Aug 12 2001Aug 16 2001

Other

OtherProceedings of the 14th International Vacuum Microelectronics Conference
CountryUnited States
CityDavis, CA
Period8/12/018/16/01

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces

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