Abstract
Results of past studies have demonstrated the potential of diamond for field emitters. However, the mechanism of the electron emission from diamond to vacuum is not clear at present. This paper reports the finding that field emission from diamond is drastically affected by plasma treatment. That is, hydrogen plasma treatment increases the emission current while oxygen plasma treatment decreases it.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC |
| Publisher | IEEE |
| Pages | 283-286 |
| Number of pages | 4 |
| Publication status | Published - 1995 |
| Externally published | Yes |
| Event | Proceedings of the 1995 8th International Vacuum Microelectronics Conference, IVMC'95 - Portland, OR, USA Duration: Jul 30 1995 → Aug 3 1995 |
Other
| Other | Proceedings of the 1995 8th International Vacuum Microelectronics Conference, IVMC'95 |
|---|---|
| City | Portland, OR, USA |
| Period | 7/30/95 → 8/3/95 |
All Science Journal Classification (ASJC) codes
- Surfaces and Interfaces
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Cite this
Asano, T., Maruta, T., Ishikura, T., & Yamashita, S. (1995). Field emission from plasma-treated diamond particles. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC (pp. 283-286). IEEE.