Field emission from plasma-treated diamond particles

Tanemasa Asano, Tetsuya Maruta, Takefumi Ishikura, Satoshi Yamashita

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Results of past studies have demonstrated the potential of diamond for field emitters. However, the mechanism of the electron emission from diamond to vacuum is not clear at present. This paper reports the finding that field emission from diamond is drastically affected by plasma treatment. That is, hydrogen plasma treatment increases the emission current while oxygen plasma treatment decreases it.

Original languageEnglish
Title of host publicationProceedings of the IEEE International Vacuum Microelectronics Conference, IVMC
PublisherIEEE
Pages283-286
Number of pages4
Publication statusPublished - 1995
Externally publishedYes
EventProceedings of the 1995 8th International Vacuum Microelectronics Conference, IVMC'95 - Portland, OR, USA
Duration: Jul 30 1995Aug 3 1995

Other

OtherProceedings of the 1995 8th International Vacuum Microelectronics Conference, IVMC'95
CityPortland, OR, USA
Period7/30/958/3/95

Fingerprint

field emission
diamonds
oxygen plasma
hydrogen plasma
electron emission
emitters
vacuum

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces

Cite this

Asano, T., Maruta, T., Ishikura, T., & Yamashita, S. (1995). Field emission from plasma-treated diamond particles. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC (pp. 283-286). IEEE.

Field emission from plasma-treated diamond particles. / Asano, Tanemasa; Maruta, Tetsuya; Ishikura, Takefumi; Yamashita, Satoshi.

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, 1995. p. 283-286.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Asano, T, Maruta, T, Ishikura, T & Yamashita, S 1995, Field emission from plasma-treated diamond particles. in Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, pp. 283-286, Proceedings of the 1995 8th International Vacuum Microelectronics Conference, IVMC'95, Portland, OR, USA, 7/30/95.
Asano T, Maruta T, Ishikura T, Yamashita S. Field emission from plasma-treated diamond particles. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE. 1995. p. 283-286
Asano, Tanemasa ; Maruta, Tetsuya ; Ishikura, Takefumi ; Yamashita, Satoshi. / Field emission from plasma-treated diamond particles. Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, 1995. pp. 283-286
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