Field emission from W tips sharpened by field-assisted nitrogen and oxygen etching

Jo Onoda, Faridur Rahman, Seigi Mizuno

    Research output: Contribution to journalArticle

    10 Citations (Scopus)

    Abstract

    Field emission properties were studied for tips sharpened using field-assisted nitrogen and oxygen etching. Sharp single crystal tungsten <111>-oriented tips were fabricated and evaluated by Fowler-Nordheim plots and field-ion microscopy observations. The results demonstrated emissions at lower bias voltages due to the sharpening of the tip apex using the etching. The field emission properties and tip shapes after nitrogen etching were compared with those obtained after oxygen etching.

    Original languageEnglish
    Pages (from-to)152-156
    Number of pages5
    Journale-Journal of Surface Science and Nanotechnology
    Volume6
    DOIs
    Publication statusPublished - Jun 7 2008

    Fingerprint

    Field emission
    field emission
    Etching
    Nitrogen
    etching
    Oxygen
    nitrogen
    Tungsten
    oxygen
    Microscopy
    Ions
    Bias voltage
    Microscopic examination
    tungsten
    apexes
    plots
    Single crystals
    microscopy
    single crystals
    electric potential

    All Science Journal Classification (ASJC) codes

    • Biotechnology
    • Bioengineering
    • Condensed Matter Physics
    • Mechanics of Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

    Cite this

    Field emission from W tips sharpened by field-assisted nitrogen and oxygen etching. / Onoda, Jo; Rahman, Faridur; Mizuno, Seigi.

    In: e-Journal of Surface Science and Nanotechnology, Vol. 6, 07.06.2008, p. 152-156.

    Research output: Contribution to journalArticle

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