Film density dependence of polymethylmethacrylate ablation under synchrotron radiation irradiation

Tsuyoshi Fujimura, Yukinori Kuroki, Tohru Hisakado, Akihiro Ikeda, Reiji Hattori, Yousuke Hakiai, Masanori Hidaka, Jae Young Choi, Suk Sang Chang

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Variations in the etch depth and refractive index of polymethylmethacrylate (PMMA) films of different molecular weights after synchrotron radiation (SR) irradiation are investigated. Reduction of the PMMA film molecular weight, density and thickness are observed after SR irradiation. The amount of film thickness loss depends on not only initial molecular weight but also film density. The PMMA density difference at the start of SR exposure affects the etch depth after SR ablation.

Original languageEnglish
Pages (from-to)916-917
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume40
Issue number2 A
Publication statusPublished - Feb 1 2001

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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