First-principles and thermodynamic analysis of trimethylgallium (TMG) decomposition during MOVPE growth of GaN

K. Sekiguchi, H. Shirakawa, Y. Yamamoto, M. Araidai, Yoshihiro Kangawa, Koichi Kakimoto, K. Shiraishi

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

We analyzed the decomposition mechanisms of trimethylgallium (TMG) used for the gallium source of GaN fabrication based on first-principles calculations and thermodynamic analysis. We considered two conditions. One condition is under the total pressure of 1 atm and the other one is under metal organic vapor phase epitaxy (MOVPE) growth of GaN. Our calculated results show that H2 is indispensable for TMG decomposition under both conditions. In GaN MOVPE, TMG with H2 spontaneously decomposes into Ga(CH3) and Ga(CH3) decomposes into Ga atom gas when temperature is higher than 440 K. From these calculations, we confirmed that TMG surely becomes Ga atom gas near the GaN substrate surfaces.

Original languageEnglish
Pages (from-to)950-953
Number of pages4
JournalJournal of Crystal Growth
Volume468
DOIs
Publication statusPublished - Jun 15 2017

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Vapor phase epitaxy
vapor phase epitaxy
Gases
Metals
Thermodynamics
Decomposition
decomposition
Atoms
thermodynamics
Gallium
metals
gas temperature
Fabrication
gallium
atoms
Substrates
fabrication
gases
Temperature

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

First-principles and thermodynamic analysis of trimethylgallium (TMG) decomposition during MOVPE growth of GaN. / Sekiguchi, K.; Shirakawa, H.; Yamamoto, Y.; Araidai, M.; Kangawa, Yoshihiro; Kakimoto, Koichi; Shiraishi, K.

In: Journal of Crystal Growth, Vol. 468, 15.06.2017, p. 950-953.

Research output: Contribution to journalArticle

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AU - Sekiguchi, K.

AU - Shirakawa, H.

AU - Yamamoto, Y.

AU - Araidai, M.

AU - Kangawa, Yoshihiro

AU - Kakimoto, Koichi

AU - Shiraishi, K.

PY - 2017/6/15

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