Fluorinated polyimide fabrication by magnetically controlled reactive ion etching (MC RIE)

A. Furuya, F. Shimokawa, T. Matsuura, Renshi Sawada

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

This paper describes the etching rates and morphologies of etched surfaces of fluorinated polyimides having fluorine concentrations, when a magnetic field parallel to the cathode surface was varied during magnetically controlled reactive ion etching (MC RIE). The fluorine concentration of fluorinated polyimides is a key parameter used to control the etching rate in MC RIE and the etching rate can also be increased by applying a high magnetic field. The etching rate was maximum when the fluorine concentration was 15-23 wt%, and the peaks became sharper as the magnetic field increased. The surface morphology also became smoother with increasing magnetic field, and SEM observation revealed that the surface morphology of 23 wt% fluorine polyimide was smoothest when a high etching rate and a high magnetic field were used.

Original languageEnglish
Article number004
Pages (from-to)67-73
Number of pages7
JournalJournal of Micromechanics and Microengineering
Volume4
Issue number2
DOIs
Publication statusPublished - Dec 1 1994

Fingerprint

Reactive ion etching
polyimides
Polyimides
Fluorine
Etching
etching
Magnetic fields
Fabrication
fabrication
fluorine
ions
Surface morphology
magnetic fields
Cathodes
Scanning electron microscopy
cathodes
scanning electron microscopy

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Fluorinated polyimide fabrication by magnetically controlled reactive ion etching (MC RIE). / Furuya, A.; Shimokawa, F.; Matsuura, T.; Sawada, Renshi.

In: Journal of Micromechanics and Microengineering, Vol. 4, No. 2, 004, 01.12.1994, p. 67-73.

Research output: Contribution to journalArticle

Furuya, A. ; Shimokawa, F. ; Matsuura, T. ; Sawada, Renshi. / Fluorinated polyimide fabrication by magnetically controlled reactive ion etching (MC RIE). In: Journal of Micromechanics and Microengineering. 1994 ; Vol. 4, No. 2. pp. 67-73.
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