Flux control of carbon nanoparticles generated due to interactions between hydrogen plasmas and graphite using DC-biased substrates

Kazunori Koga, Mizuki Tateishi, Katsushi Nishiyama, Giichiro Uchida, Kunihiro Kamataki, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Flux control of dust particles in a nanometer size range using dc bias voltage is discussed based on dust collection in a divertor simulator employed helicon hydrogen discharges. To discuss mechanisms of flux control, we have estimated etching rate of deposited dust particles due to hydrogen plasma irradiation and have measured current density toward the dc biased substrates. We have found the contribution of the etching can be negligible in a dc bias voltage Vbias range between -50 and 70 V. Clear correlation between Vbias dependence of current density and that of dust flux shows electrostatic force is one of important forces for controlling flux of dust particles.

Original languageEnglish
Article number11NA08
JournalJapanese journal of applied physics
Volume52
Issue number11 PART 2
DOIs
Publication statusPublished - Nov 1 2013

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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