Focusing mirror for x-ray free-electron lasers

Hidekazu Mimura, Shinya Morita, Takashi Kimura, Daisuke Yamakawa, Weimin Lin, Yoshihiro Uehara, Satoshi Matsuyama, Hirokatsu Yumoto, Haruhiko Ohashi, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Hitoshi Ohmori, Kazuto Yamauchi

Research output: Contribution to journalArticle

47 Citations (Scopus)

Abstract

We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.

Original languageEnglish
Article number083104
JournalReview of Scientific Instruments
Volume79
Issue number8
DOIs
Publication statusPublished - Sep 8 2008
Externally publishedYes

Fingerprint

x ray lasers
Free electron lasers
free electron lasers
Mirrors
mirrors
X rays
grinding
smoothing
machining
Laser beams
valleys
Machining
laser beams
electron beams
Fabrication
Silicon
fabrication
evaluation
silicon

All Science Journal Classification (ASJC) codes

  • Instrumentation

Cite this

Mimura, H., Morita, S., Kimura, T., Yamakawa, D., Lin, W., Uehara, Y., ... Yamauchi, K. (2008). Focusing mirror for x-ray free-electron lasers. Review of Scientific Instruments, 79(8), [083104]. https://doi.org/10.1063/1.2964928

Focusing mirror for x-ray free-electron lasers. / Mimura, Hidekazu; Morita, Shinya; Kimura, Takashi; Yamakawa, Daisuke; Lin, Weimin; Uehara, Yoshihiro; Matsuyama, Satoshi; Yumoto, Hirokatsu; Ohashi, Haruhiko; Tamasaku, Kenji; Nishino, Yoshinori; Yabashi, Makina; Ishikawa, Tetsuya; Ohmori, Hitoshi; Yamauchi, Kazuto.

In: Review of Scientific Instruments, Vol. 79, No. 8, 083104, 08.09.2008.

Research output: Contribution to journalArticle

Mimura, H, Morita, S, Kimura, T, Yamakawa, D, Lin, W, Uehara, Y, Matsuyama, S, Yumoto, H, Ohashi, H, Tamasaku, K, Nishino, Y, Yabashi, M, Ishikawa, T, Ohmori, H & Yamauchi, K 2008, 'Focusing mirror for x-ray free-electron lasers', Review of Scientific Instruments, vol. 79, no. 8, 083104. https://doi.org/10.1063/1.2964928
Mimura H, Morita S, Kimura T, Yamakawa D, Lin W, Uehara Y et al. Focusing mirror for x-ray free-electron lasers. Review of Scientific Instruments. 2008 Sep 8;79(8). 083104. https://doi.org/10.1063/1.2964928
Mimura, Hidekazu ; Morita, Shinya ; Kimura, Takashi ; Yamakawa, Daisuke ; Lin, Weimin ; Uehara, Yoshihiro ; Matsuyama, Satoshi ; Yumoto, Hirokatsu ; Ohashi, Haruhiko ; Tamasaku, Kenji ; Nishino, Yoshinori ; Yabashi, Makina ; Ishikawa, Tetsuya ; Ohmori, Hitoshi ; Yamauchi, Kazuto. / Focusing mirror for x-ray free-electron lasers. In: Review of Scientific Instruments. 2008 ; Vol. 79, No. 8.
@article{5565b06364ba4c68adac1ecdd1259b2a,
title = "Focusing mirror for x-ray free-electron lasers",
abstract = "We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.",
author = "Hidekazu Mimura and Shinya Morita and Takashi Kimura and Daisuke Yamakawa and Weimin Lin and Yoshihiro Uehara and Satoshi Matsuyama and Hirokatsu Yumoto and Haruhiko Ohashi and Kenji Tamasaku and Yoshinori Nishino and Makina Yabashi and Tetsuya Ishikawa and Hitoshi Ohmori and Kazuto Yamauchi",
year = "2008",
month = "9",
day = "8",
doi = "10.1063/1.2964928",
language = "English",
volume = "79",
journal = "Review of Scientific Instruments",
issn = "0034-6748",
publisher = "American Institute of Physics Publising LLC",
number = "8",

}

TY - JOUR

T1 - Focusing mirror for x-ray free-electron lasers

AU - Mimura, Hidekazu

AU - Morita, Shinya

AU - Kimura, Takashi

AU - Yamakawa, Daisuke

AU - Lin, Weimin

AU - Uehara, Yoshihiro

AU - Matsuyama, Satoshi

AU - Yumoto, Hirokatsu

AU - Ohashi, Haruhiko

AU - Tamasaku, Kenji

AU - Nishino, Yoshinori

AU - Yabashi, Makina

AU - Ishikawa, Tetsuya

AU - Ohmori, Hitoshi

AU - Yamauchi, Kazuto

PY - 2008/9/8

Y1 - 2008/9/8

N2 - We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.

AB - We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.

UR - http://www.scopus.com/inward/record.url?scp=50849108819&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50849108819&partnerID=8YFLogxK

U2 - 10.1063/1.2964928

DO - 10.1063/1.2964928

M3 - Article

C2 - 19044333

AN - SCOPUS:50849108819

VL - 79

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

IS - 8

M1 - 083104

ER -