Focusing mirror for x-ray free-electron lasers

Hidekazu Mimura, Shinya Morita, Takashi Kimura, Daisuke Yamakawa, Weimin Lin, Yoshihiro Uehara, Satoshi Matsuyama, Hirokatsu Yumoto, Haruhiko Ohashi, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Hitoshi Ohmori, Kazuto Yamauchi

Research output: Contribution to journalArticle

49 Citations (Scopus)


We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.

Original languageEnglish
Article number083104
JournalReview of Scientific Instruments
Issue number8
Publication statusPublished - Sep 8 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Instrumentation

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