Foreseeing and active-suppression of anomalous discharge in plasma processing equipment by in-situ monitoring of plasma state using viewing port probe

M. Yasaka, M. Takeshita, M. Tama, T. Kitamura, N. Ito, Y. Itagaki, F. Uesugi, K. Okamura, A. Kodama, R. Miyagawa, K. Ishimatsu, M. Hagiwara, T. Asano

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Engineering & Materials Science

Chemical Compounds