Foreseeing and active-suppression of anomalous discharge in plasma processing equipment by in-situ monitoring of plasma state using viewing port probe

M. Yasaka, M. Takeshita, M. Tama, T. Kitamura, N. Ito, Y. Itagaki, F. Uesugi, K. Okamura, A. Kodama, R. Miyagawa, K. Ishimatsu, M. Hagiwara, T. Asano

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

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Engineering & Materials Science

Chemical Compounds