Foreword: Advanced plasma science and its applications for nitride and nanomaterials

Akihiro Wakahara, Osamu Nakatsuka, Minoru Sasaki, Kazuo Terashima, Hiroshi Amano, Takashi Egawa, Yasufumi Fujiwara, Mineo Hiramatsu, Ryoichi Ichino, Yasushi Inoue, Masafumi Ito, Makoto Kasu, Hiroki Kondo, Seiichi Miyazaki, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Hirofumi Takikawa, Yoshimi Watanabe

Research output: Contribution to journalEditorial

Original languageEnglish
Article number016501
JournalJapanese Journal of Applied Physics
Volume55
Issue number1
DOIs
Publication statusPublished - Jan 2016

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Wakahara, A., Nakatsuka, O., Sasaki, M., Terashima, K., Amano, H., Egawa, T., Fujiwara, Y., Hiramatsu, M., Ichino, R., Inoue, Y., Ito, M., Kasu, M., Kondo, H., Miyazaki, S., Sawada, K., Sekine, M., Setsuhara, Y., Shiratani, M., Takikawa, H., & Watanabe, Y. (2016). Foreword: Advanced plasma science and its applications for nitride and nanomaterials. Japanese Journal of Applied Physics, 55(1), [016501]. https://doi.org/10.7567/JJAP.55.01A001