Foreword: Advanced plasma science and its applications for nitride and nanomaterials

Akihiro Wakahara, Osamu Nakatsuka, Minoru Sasaki, Kazuo Terashima, Hiroshi Amano, Takashi Egawa, Yasufumi Fujiwara, Mineo Hiramatsu, Ryoichi Ichino, Yasushi Inoue, Masafumi Ito, Makoto Kasu, Hiroki Kondo, Seiichi Miyazaki, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Hirofumi Takikawa, Yoshimi Watanabe

Research output: Contribution to journalEditorial

Original languageEnglish
Article number016501
JournalJapanese Journal of Applied Physics
Volume55
Issue number1
DOIs
Publication statusPublished - Jan 1 2016

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Nanostructured materials
Nitrides
nitrides
Plasmas

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Wakahara, A., Nakatsuka, O., Sasaki, M., Terashima, K., Amano, H., Egawa, T., ... Watanabe, Y. (2016). Foreword: Advanced plasma science and its applications for nitride and nanomaterials. Japanese Journal of Applied Physics, 55(1), [016501]. https://doi.org/10.7567/JJAP.55.01A001

Foreword : Advanced plasma science and its applications for nitride and nanomaterials. / Wakahara, Akihiro; Nakatsuka, Osamu; Sasaki, Minoru; Terashima, Kazuo; Amano, Hiroshi; Egawa, Takashi; Fujiwara, Yasufumi; Hiramatsu, Mineo; Ichino, Ryoichi; Inoue, Yasushi; Ito, Masafumi; Kasu, Makoto; Kondo, Hiroki; Miyazaki, Seiichi; Sawada, Kazuaki; Sekine, Makoto; Setsuhara, Yuichi; Shiratani, Masaharu; Takikawa, Hirofumi; Watanabe, Yoshimi.

In: Japanese Journal of Applied Physics, Vol. 55, No. 1, 016501, 01.01.2016.

Research output: Contribution to journalEditorial

Wakahara, A, Nakatsuka, O, Sasaki, M, Terashima, K, Amano, H, Egawa, T, Fujiwara, Y, Hiramatsu, M, Ichino, R, Inoue, Y, Ito, M, Kasu, M, Kondo, H, Miyazaki, S, Sawada, K, Sekine, M, Setsuhara, Y, Shiratani, M, Takikawa, H & Watanabe, Y 2016, 'Foreword: Advanced plasma science and its applications for nitride and nanomaterials', Japanese Journal of Applied Physics, vol. 55, no. 1, 016501. https://doi.org/10.7567/JJAP.55.01A001
Wakahara, Akihiro ; Nakatsuka, Osamu ; Sasaki, Minoru ; Terashima, Kazuo ; Amano, Hiroshi ; Egawa, Takashi ; Fujiwara, Yasufumi ; Hiramatsu, Mineo ; Ichino, Ryoichi ; Inoue, Yasushi ; Ito, Masafumi ; Kasu, Makoto ; Kondo, Hiroki ; Miyazaki, Seiichi ; Sawada, Kazuaki ; Sekine, Makoto ; Setsuhara, Yuichi ; Shiratani, Masaharu ; Takikawa, Hirofumi ; Watanabe, Yoshimi. / Foreword : Advanced plasma science and its applications for nitride and nanomaterials. In: Japanese Journal of Applied Physics. 2016 ; Vol. 55, No. 1.
@article{68041ffa43f74fe8bce5d3963babd7ac,
title = "Foreword: Advanced plasma science and its applications for nitride and nanomaterials",
author = "Akihiro Wakahara and Osamu Nakatsuka and Minoru Sasaki and Kazuo Terashima and Hiroshi Amano and Takashi Egawa and Yasufumi Fujiwara and Mineo Hiramatsu and Ryoichi Ichino and Yasushi Inoue and Masafumi Ito and Makoto Kasu and Hiroki Kondo and Seiichi Miyazaki and Kazuaki Sawada and Makoto Sekine and Yuichi Setsuhara and Masaharu Shiratani and Hirofumi Takikawa and Yoshimi Watanabe",
year = "2016",
month = "1",
day = "1",
doi = "10.7567/JJAP.55.01A001",
language = "English",
volume = "55",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Institute of Physics",
number = "1",

}

TY - JOUR

T1 - Foreword

T2 - Advanced plasma science and its applications for nitride and nanomaterials

AU - Wakahara, Akihiro

AU - Nakatsuka, Osamu

AU - Sasaki, Minoru

AU - Terashima, Kazuo

AU - Amano, Hiroshi

AU - Egawa, Takashi

AU - Fujiwara, Yasufumi

AU - Hiramatsu, Mineo

AU - Ichino, Ryoichi

AU - Inoue, Yasushi

AU - Ito, Masafumi

AU - Kasu, Makoto

AU - Kondo, Hiroki

AU - Miyazaki, Seiichi

AU - Sawada, Kazuaki

AU - Sekine, Makoto

AU - Setsuhara, Yuichi

AU - Shiratani, Masaharu

AU - Takikawa, Hirofumi

AU - Watanabe, Yoshimi

PY - 2016/1/1

Y1 - 2016/1/1

UR - http://www.scopus.com/inward/record.url?scp=84953231997&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84953231997&partnerID=8YFLogxK

U2 - 10.7567/JJAP.55.01A001

DO - 10.7567/JJAP.55.01A001

M3 - Editorial

AN - SCOPUS:84953231997

VL - 55

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 1

M1 - 016501

ER -