Formation and structural characterization of nanocrystalline Si/SiC multilayers grown by hot filament assisted chemical vapor deposition using CH3SiH3 gas jets

Yoshifumi Ikoma, Ryousuke Okuyama, Makoto Arita, Teruaki Motooka

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5 Citations (Scopus)

Abstract

We report on the formation and the structural characterization of nanocrystalline Si/SiC (nc-Si/SiC) multilayers on Si(100) by hot filament assisted chemical vapor deposition using CH3SiH3 gas pulse jets. Si rich amorphous SiC (a-Si1 - xCx, x ~ 0.33) was initially grown at the substrate temperature (Ts) of 600 °C with heating a hot filament at ~ 2000 °C. The following crystalline SiC layers were grown at Ts = 850 °C without utilizing a hot filament. When the a-Si1 - xCx layer was ultrathin (< 2 nm) on Si(100), this a-Si1 - xCx layer was transformed to a single epitaxial SiC layer during the subsequent SiC growth process. The Si{111} faceted pits were formed at the SiC/Si(100) interface due to Si diffusion processes from the substrate. When the thickness of the initial a-Si1 - xCx layer was increased to ~ 5 nm, a double layer structure was formed in which this amorphous layer was changed to nc-Si and nc-SiC was grown on the top resulting in the considerable reduction of the {111} faceted pits. It was found that nc-SiC was formed by consuming the Si atoms uniformly diffused from the a-Si1 - xCx layer below and that Si nanocrystals were generated in the a-Si1 - xCx layers due to the annealing effect during further multilayer growths.

Original languageEnglish
Pages (from-to)3759-3762
Number of pages4
JournalThin Solid Films
Volume518
Issue number14
DOIs
Publication statusPublished - May 3 2010

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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