Formation mechanism of amorphous silicon nanoparticles with additional counter-flow quenching gas by induction thermal plasma

Xiaoyu Zhang, Zishen Liu, Manabu Tanaka, Takayuki Watanabe

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

The fabrication process of amorphous silicon nanoparticles by induction thermal plasma was studied by experiments and numerical simulations. Additional quenching gas was introduced as counter-flow to the plasma tail flame to enhance quenching effect. The flow rate of quenching gas ranged from 0 to 70 L/min. Amorphous silicon nanoparticles were confirmed by electronic diffraction analysis with random shapes and serious agglomerate, while the crystal particles had a totally different morphology of spherical and freestanding. The quenching rate was estimated on the basis of numerical results and increased from 3.2 × 104 to 8.9 × 105 K/s with quenching gas flow rate. The amount of amorphous silicon increased as quenching gas injection and should be attributed to the improved preparation of small nanoparticles (<5 nm). The above results suggested the formation of amorphous silicon in thermal plasma is controllable.

Original languageEnglish
Article number116217
JournalChemical Engineering Science
Volume230
DOIs
Publication statusPublished - Feb 2 2021

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

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