Formation of a hybrid plasmonic waveguide mode probed by dispersion measurement

Hybrid waveguides, i.e., dielectric waveguides combined with plasmonic waveguides, have great potential for concomitantly exhibiting subwavelength confinement and long range propagation, enabling a highly integrated photonic circuit. We report the characterization of hybrid waveguide modes excited in Si/SiO₂/Al films, by dispersion measurement using angle-resolved electron energy-loss spectroscopy. This experiment directly verifies the formation of the hybrid waveguide mode with a strongly localized electromagnetic field in a 6-nm-thick SiO₂ layer. The results clearly describe the characteristic behavior of the hybrid waveguide mode, which depends on the effective index of the constituent dielectric waveguide and the surface plasmon-polariton modes.