Formation of high-purity organic thin films by gas flow deposition and the effect of impurities on device characteristics

Kohei Tsugita, Tomohiko Edura, Masayuki Yahiro, Chihaya Adachi

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

A gas flow deposition (GFD) system was developed to manufacture large-scale organic light-emitting diodes (OLEDs). A N,N′-di(1-naphthyl)-N,N′- diphenylbenzidine (α-NPD) thin film with a high purity of 99.97% was obtained using the GFD system. The film properties such as morphology, and electrical and optical characteristics were almost the same as those of films made by conventional vacuum thermal evaporation.

Original languageEnglish
Pages (from-to)418-422
Number of pages5
JournalDisplays
Volume34
Issue number5
DOIs
Publication statusPublished - Sep 23 2013

Fingerprint

Flow of gases
Impurities
Thin films
Vacuum evaporation
Thermal evaporation
Organic light emitting diodes (OLED)

All Science Journal Classification (ASJC) codes

  • Human-Computer Interaction
  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Formation of high-purity organic thin films by gas flow deposition and the effect of impurities on device characteristics. / Tsugita, Kohei; Edura, Tomohiko; Yahiro, Masayuki; Adachi, Chihaya.

In: Displays, Vol. 34, No. 5, 23.09.2013, p. 418-422.

Research output: Contribution to journalArticle

Tsugita, Kohei ; Edura, Tomohiko ; Yahiro, Masayuki ; Adachi, Chihaya. / Formation of high-purity organic thin films by gas flow deposition and the effect of impurities on device characteristics. In: Displays. 2013 ; Vol. 34, No. 5. pp. 418-422.
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