TY - JOUR
T1 - Formation of low resistivity layers on singlecrystalline diamond by excimer laser irradiation
AU - Abubakr, Eslam
AU - Zkria, Abdelrahman
AU - Katamune, Yūki
AU - Ohmagari, Shinya
AU - Imokawa, Kaname
AU - Ikenoue, Hiroshi
AU - Yoshitake, Tsuyoshi
N1 - Funding Information:
This study was partially supported by JSPS KAKENHI Grant Numbers JP15H04127 , JP16K14391 , JP17F17380 , and JP19H02436 . First author Eslam Abubakr thanks the financial assistance provided by the Kyushu University Advanced Graduate Program in the Global Strategy for Green Asia.
PY - 2019/5
Y1 - 2019/5
N2 - A singlecrystalline diamond (100)(Ib) plate immersed in 2% boric acid was irradiated by 193-nm ArF excimer laser beams for the formation of conductive layers on the surface of an insulating diamond substrate. From current-voltage measurements of the irradiated areas, it was confirmed that semiconducting layers with high conductivities are formed on the diamond surface. It was possible to form ohmic contacts by directly touching tungsten probes with the layer surface. Since Raman spectra exhibited only peaks due to diamond and no peaks due to amorphous carbon, the drastically enhanced conductivity is not attributed to amorphous carbon formation but due to the incorporation of boron atoms into the diamond subsurface from the dopant acid. Secondary ion mass spectrometric depth profile showed the incorporation of boron atoms up to 40 nm depths from the surface. From cathodoluminescence measurements at low temperatures, it was difficult to detect clear peaks for the substitutional incorporation of boron atoms into diamond lattices, which could be attributed to the small thickness of the doped layer for detection. The proposed technique is a new potential method for shallow doping and formation of conductive layers on singlecrystalline diamond surfaces.
AB - A singlecrystalline diamond (100)(Ib) plate immersed in 2% boric acid was irradiated by 193-nm ArF excimer laser beams for the formation of conductive layers on the surface of an insulating diamond substrate. From current-voltage measurements of the irradiated areas, it was confirmed that semiconducting layers with high conductivities are formed on the diamond surface. It was possible to form ohmic contacts by directly touching tungsten probes with the layer surface. Since Raman spectra exhibited only peaks due to diamond and no peaks due to amorphous carbon, the drastically enhanced conductivity is not attributed to amorphous carbon formation but due to the incorporation of boron atoms into the diamond subsurface from the dopant acid. Secondary ion mass spectrometric depth profile showed the incorporation of boron atoms up to 40 nm depths from the surface. From cathodoluminescence measurements at low temperatures, it was difficult to detect clear peaks for the substitutional incorporation of boron atoms into diamond lattices, which could be attributed to the small thickness of the doped layer for detection. The proposed technique is a new potential method for shallow doping and formation of conductive layers on singlecrystalline diamond surfaces.
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U2 - 10.1016/j.diamond.2019.04.013
DO - 10.1016/j.diamond.2019.04.013
M3 - Article
AN - SCOPUS:85064398557
SN - 0925-9635
VL - 95
SP - 166
EP - 173
JO - Diamond and Related Materials
JF - Diamond and Related Materials
ER -