Formation of mesoscopic polymer dots by rubbing transfer

M. Sano, J. Okamura, S. Shinkai

Research output: Contribution to journalConference article

Abstract

Regularly spaced polymer dots are formed on a silicon surface by rubbing a thin polymer plate against the silicon substrate. Typically, the disk-shaped dots are 10 nm in height and 160 nm in diameter, and are separated by 340 nm from each other. It is found that the substrate temperature, the rubbing rate, the polymer viscoelasticity, and wettability against a substrate surface must be within a certain range to produce the aligned dots.

Original languageEnglish
Pages (from-to)155-158
Number of pages4
JournalMaterials Research Society Symposium - Proceedings
Volume576
Publication statusPublished - Dec 1 1999
Externally publishedYes
EventProceedings of the 1999 MRS Spring Meeting - Symposium DD, 'Organic/Inorganic Hybrid Materials' - San Francisco, CA, USA
Duration: Apr 5 1999Apr 9 1999

Fingerprint

Polymers
Silicon
polymers
Substrates
viscoelasticity
Viscoelasticity
silicon
wettability
Wetting
Temperature
temperature

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Formation of mesoscopic polymer dots by rubbing transfer. / Sano, M.; Okamura, J.; Shinkai, S.

In: Materials Research Society Symposium - Proceedings, Vol. 576, 01.12.1999, p. 155-158.

Research output: Contribution to journalConference article

Sano, M. ; Okamura, J. ; Shinkai, S. / Formation of mesoscopic polymer dots by rubbing transfer. In: Materials Research Society Symposium - Proceedings. 1999 ; Vol. 576. pp. 155-158.
@article{6c705952b75a4359a385be04522ecaa3,
title = "Formation of mesoscopic polymer dots by rubbing transfer",
abstract = "Regularly spaced polymer dots are formed on a silicon surface by rubbing a thin polymer plate against the silicon substrate. Typically, the disk-shaped dots are 10 nm in height and 160 nm in diameter, and are separated by 340 nm from each other. It is found that the substrate temperature, the rubbing rate, the polymer viscoelasticity, and wettability against a substrate surface must be within a certain range to produce the aligned dots.",
author = "M. Sano and J. Okamura and S. Shinkai",
year = "1999",
month = "12",
day = "1",
language = "English",
volume = "576",
pages = "155--158",
journal = "Materials Research Society Symposium - Proceedings",
issn = "0272-9172",
publisher = "Materials Research Society",

}

TY - JOUR

T1 - Formation of mesoscopic polymer dots by rubbing transfer

AU - Sano, M.

AU - Okamura, J.

AU - Shinkai, S.

PY - 1999/12/1

Y1 - 1999/12/1

N2 - Regularly spaced polymer dots are formed on a silicon surface by rubbing a thin polymer plate against the silicon substrate. Typically, the disk-shaped dots are 10 nm in height and 160 nm in diameter, and are separated by 340 nm from each other. It is found that the substrate temperature, the rubbing rate, the polymer viscoelasticity, and wettability against a substrate surface must be within a certain range to produce the aligned dots.

AB - Regularly spaced polymer dots are formed on a silicon surface by rubbing a thin polymer plate against the silicon substrate. Typically, the disk-shaped dots are 10 nm in height and 160 nm in diameter, and are separated by 340 nm from each other. It is found that the substrate temperature, the rubbing rate, the polymer viscoelasticity, and wettability against a substrate surface must be within a certain range to produce the aligned dots.

UR - http://www.scopus.com/inward/record.url?scp=0033342314&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033342314&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0033342314

VL - 576

SP - 155

EP - 158

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

SN - 0272-9172

ER -