Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method

Masahito Sano, Jyunko Okamura, Seiji Shinkai

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.

Original languageEnglish
Pages (from-to)21-22
Number of pages2
JournalChemistry Letters
Issue number1
DOIs
Publication statusPublished - Jan 1 1998
Externally publishedYes

Fingerprint

Silicon
Polymers
Friction
Melting point
Deposits
ethylene

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

Cite this

Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method. / Sano, Masahito; Okamura, Jyunko; Shinkai, Seiji.

In: Chemistry Letters, No. 1, 01.01.1998, p. 21-22.

Research output: Contribution to journalArticle

Sano, Masahito ; Okamura, Jyunko ; Shinkai, Seiji. / Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method. In: Chemistry Letters. 1998 ; No. 1. pp. 21-22.
@article{dd9186f234cd4cc9bedfa8d16c2e2c32,
title = "Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method",
abstract = "Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.",
author = "Masahito Sano and Jyunko Okamura and Seiji Shinkai",
year = "1998",
month = "1",
day = "1",
doi = "10.1246/cl.1998.21",
language = "English",
pages = "21--22",
journal = "Chemistry Letters",
issn = "0366-7022",
publisher = "The Chemical Society of Japan",
number = "1",

}

TY - JOUR

T1 - Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method

AU - Sano, Masahito

AU - Okamura, Jyunko

AU - Shinkai, Seiji

PY - 1998/1/1

Y1 - 1998/1/1

N2 - Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.

AB - Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.

UR - http://www.scopus.com/inward/record.url?scp=0032376353&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032376353&partnerID=8YFLogxK

U2 - 10.1246/cl.1998.21

DO - 10.1246/cl.1998.21

M3 - Article

AN - SCOPUS:0032376353

SP - 21

EP - 22

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 1

ER -